STATE OF BONDING AND DISTRIBUTION OF THE IMPURITIES IN K-AL-SI DOPED TUNGSTEN.

A. Kele, M. Menyhárd, L. Uray, I. Gaal

Research output: Chapter in Book/Report/Conference proceedingChapter

2 Citations (Scopus)

Abstract

Silicon rejects both phosphorus and sulphur from the surface and hydrogen cleans the surface from silicon. Sulphur might be present in doped tungsten in various states of bonding and some of these bonds disintegrate in the presence of hydrogen. Aluminium oxide formed by internal oxidation in tungsten can be reduced to solute aluminium and oxygen upon annealing at 2400 K in dry hydrogen or at 3000 K in a vacuum of 10** minus **6 Torr. Internal oxidation and reduction also take place in commercial tungsten wires. The radial distribution of the solutes, due to evaporation during sintering, is in some cases conserved during swaging and drawing, too.

Original languageEnglish
Title of host publicationPlanseeber Pulvermetall
Pages3-13
Number of pages11
Volume26
Edition1
Publication statusPublished - Mar 1978

Fingerprint

Tungsten
Internal oxidation
Impurities
Hydrogen
Sulfur
Swaging
Aluminum
Silicon
Phosphorus
Evaporation
Sintering
Wire
Vacuum
Annealing
Oxides
Oxygen

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Kele, A., Menyhárd, M., Uray, L., & Gaal, I. (1978). STATE OF BONDING AND DISTRIBUTION OF THE IMPURITIES IN K-AL-SI DOPED TUNGSTEN. In Planseeber Pulvermetall (1 ed., Vol. 26, pp. 3-13)

STATE OF BONDING AND DISTRIBUTION OF THE IMPURITIES IN K-AL-SI DOPED TUNGSTEN. / Kele, A.; Menyhárd, M.; Uray, L.; Gaal, I.

Planseeber Pulvermetall. Vol. 26 1. ed. 1978. p. 3-13.

Research output: Chapter in Book/Report/Conference proceedingChapter

Kele, A, Menyhárd, M, Uray, L & Gaal, I 1978, STATE OF BONDING AND DISTRIBUTION OF THE IMPURITIES IN K-AL-SI DOPED TUNGSTEN. in Planseeber Pulvermetall. 1 edn, vol. 26, pp. 3-13.
Kele A, Menyhárd M, Uray L, Gaal I. STATE OF BONDING AND DISTRIBUTION OF THE IMPURITIES IN K-AL-SI DOPED TUNGSTEN. In Planseeber Pulvermetall. 1 ed. Vol. 26. 1978. p. 3-13
Kele, A. ; Menyhárd, M. ; Uray, L. ; Gaal, I. / STATE OF BONDING AND DISTRIBUTION OF THE IMPURITIES IN K-AL-SI DOPED TUNGSTEN. Planseeber Pulvermetall. Vol. 26 1. ed. 1978. pp. 3-13
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