Spectroellipsometric characterization of nanocrystalline diamond layers

T. Lohner, P. Csíkvári, P. Petrik, G. Hárs

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The complex refractive index and the layer thickness of nanocrystalline diamond films was determined by ex situ variable angle spectroscopic ellipsometry in the wavelength range of 191-1690 nm. During the layer depositions argon, methane and hydrogen gases were used as source gases. The combined effect of argon addition and substrate bias was investigated in the microwave plasma assisted chemical vapor deposition of diamond. Multilayer optical models were constructed for the evaluation of the measured ellipsometric spectra. The effective medium approximation and the Lorentz dispersion relation were employed for the modeling of the optical properties of the diamond films.

Original languageEnglish
Pages (from-to)113-117
Number of pages5
JournalApplied Surface Science
Volume281
DOIs
Publication statusPublished - Sep 15 2013

Fingerprint

Diamond
Argon
Diamond films
Diamonds
Optical multilayers
Gases
Spectroscopic ellipsometry
Methane
Hydrogen
Chemical vapor deposition
Refractive index
Optical properties
Microwaves
Plasmas
Wavelength
Substrates

Keywords

  • Microwave plasma enhanced CVD
  • Nanocrystalline diamond
  • Optical modeling
  • Spectroscopic ellipsometry

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Spectroellipsometric characterization of nanocrystalline diamond layers. / Lohner, T.; Csíkvári, P.; Petrik, P.; Hárs, G.

In: Applied Surface Science, Vol. 281, 15.09.2013, p. 113-117.

Research output: Contribution to journalArticle

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