Some aspects of the thermal decomposition of InP surfaces

Ferenc Riesz, L. Dobos, J. Karanyi, A. L. Toth, C. Vignali, C. Pelosi, K. Rakennus, T. Hakkarainen

Research output: Contribution to journalConference article

Abstract

Thermal decomposition of bulk and heteroepitaxial InP surfaces is studied by scanning electron microscopy (SEM), atomic force microscopy and in-situ SEM and mass spectrometry. Correlation is established between the evaporation of phosphorous and the formation of thermal etch pits. Only negligible roughening is induced by annealing outside the pits.

Original languageEnglish
Pages (from-to)352-355
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3316
Issue number1
Publication statusPublished - Dec 1 1998
EventProceedings of the 1997 9th International Workshop on the Physics of Semiconductor Devices, IWPSD. Part 1 (of 2) - Delhi, India
Duration: Dec 16 1997Dec 20 1997

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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