Small bond angles in amorphous silicon: Are they a new type of defect?

S. Kugler, K. Kohary, K. Kádas, L. Pusztai

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The reverse Monte Carlo structural modeling method and tight-binding molecular dynamics simulations were applied in order to investigate the existence of small bond angles (like those in triangles and squares) in amorphous silicon networks. The influence of small bond angles on the electronic density of states was also analyzed. It is shown that the presence of a small number of bond angles around 75° is necessary for a proper reproduction of the experimental structure factor of vapor deposited amorphous silicon.

Original languageEnglish
Pages (from-to)425-429
Number of pages5
JournalJournal of Non-Crystalline Solids
Volume338-340
Issue number1 SPEC. ISS.
DOIs
Publication statusPublished - Jun 15 2004

Fingerprint

Amorphous silicon
amorphous silicon
Defects
Electronic density of states
defects
Molecular dynamics
Vapors
triangles
Computer simulation
vapors
molecular dynamics
electronics
simulation

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Small bond angles in amorphous silicon : Are they a new type of defect? / Kugler, S.; Kohary, K.; Kádas, K.; Pusztai, L.

In: Journal of Non-Crystalline Solids, Vol. 338-340, No. 1 SPEC. ISS., 15.06.2004, p. 425-429.

Research output: Contribution to journalArticle

Kugler, S. ; Kohary, K. ; Kádas, K. ; Pusztai, L. / Small bond angles in amorphous silicon : Are they a new type of defect?. In: Journal of Non-Crystalline Solids. 2004 ; Vol. 338-340, No. 1 SPEC. ISS. pp. 425-429.
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