Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV

Simone Berneschi, Massimo Brenci, Gualtiero Nunzi Conti, Stefano Pelli, Marco Bettinelli, Adolfo Speghini, Istvan Bnysz, M. Fried, Nguyen Q. Khanh, T. Lohner, P. Petrik, A. Watterich, Z. Zolnai

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Slab optical waveguides were fabricated in tung-sten-tellurite glass doped with Er3 ions by means of nitrogen ion implantation at 1.5 MeV. A wide range of ion doses (from 51012 to 8.1016 ionscm 2) was used. Optical characterization, performed by dark-line spectroscopy, revealed that the waveguides were of optical barrier type: the implanted layer exhibited a decrease of the refractive index with respect to the virgin bulk glass, while the region comprised between the sample surface and the end of the ion track acted as an optical guiding structure. It was also demonstrated that a post-implantation annealing process, performed at various temperatures on the samples implanted at higher doses, contributes to the reduction of the barrier region.

Original languageEnglish
Article number071110
JournalOptical Engineering
Volume50
Issue number7
DOIs
Publication statusPublished - Jul 2011

Fingerprint

Optical waveguides
Ion implantation
optical waveguides
ion implantation
slabs
Glass
glass
Ions
dosage
ions
Telephone lines
nitrogen ions
implantation
Refractive index
Waveguides
Spectroscopy
Annealing
refractivity
Nitrogen
waveguides

Keywords

  • Er-doped glass
  • Er-doped waveguide amplifier
  • Ion implantation
  • Slab waveguides
  • Tellurite glass

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)

Cite this

Berneschi, S., Brenci, M., Nunzi Conti, G., Pelli, S., Bettinelli, M., Speghini, A., ... Zolnai, Z. (2011). Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV. Optical Engineering, 50(7), [071110]. https://doi.org/10.1117/1.3559209

Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV. / Berneschi, Simone; Brenci, Massimo; Nunzi Conti, Gualtiero; Pelli, Stefano; Bettinelli, Marco; Speghini, Adolfo; Bnysz, Istvan; Fried, M.; Khanh, Nguyen Q.; Lohner, T.; Petrik, P.; Watterich, A.; Zolnai, Z.

In: Optical Engineering, Vol. 50, No. 7, 071110, 07.2011.

Research output: Contribution to journalArticle

Berneschi, S, Brenci, M, Nunzi Conti, G, Pelli, S, Bettinelli, M, Speghini, A, Bnysz, I, Fried, M, Khanh, NQ, Lohner, T, Petrik, P, Watterich, A & Zolnai, Z 2011, 'Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV', Optical Engineering, vol. 50, no. 7, 071110. https://doi.org/10.1117/1.3559209
Berneschi S, Brenci M, Nunzi Conti G, Pelli S, Bettinelli M, Speghini A et al. Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV. Optical Engineering. 2011 Jul;50(7). 071110. https://doi.org/10.1117/1.3559209
Berneschi, Simone ; Brenci, Massimo ; Nunzi Conti, Gualtiero ; Pelli, Stefano ; Bettinelli, Marco ; Speghini, Adolfo ; Bnysz, Istvan ; Fried, M. ; Khanh, Nguyen Q. ; Lohner, T. ; Petrik, P. ; Watterich, A. ; Zolnai, Z. / Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV. In: Optical Engineering. 2011 ; Vol. 50, No. 7.
@article{ee7d2b8c255a451c83a12bff1d505544,
title = "Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV",
abstract = "Slab optical waveguides were fabricated in tung-sten-tellurite glass doped with Er3 ions by means of nitrogen ion implantation at 1.5 MeV. A wide range of ion doses (from 51012 to 8.1016 ionscm 2) was used. Optical characterization, performed by dark-line spectroscopy, revealed that the waveguides were of optical barrier type: the implanted layer exhibited a decrease of the refractive index with respect to the virgin bulk glass, while the region comprised between the sample surface and the end of the ion track acted as an optical guiding structure. It was also demonstrated that a post-implantation annealing process, performed at various temperatures on the samples implanted at higher doses, contributes to the reduction of the barrier region.",
keywords = "Er-doped glass, Er-doped waveguide amplifier, Ion implantation, Slab waveguides, Tellurite glass",
author = "Simone Berneschi and Massimo Brenci and {Nunzi Conti}, Gualtiero and Stefano Pelli and Marco Bettinelli and Adolfo Speghini and Istvan Bnysz and M. Fried and Khanh, {Nguyen Q.} and T. Lohner and P. Petrik and A. Watterich and Z. Zolnai",
year = "2011",
month = "7",
doi = "10.1117/1.3559209",
language = "English",
volume = "50",
journal = "Optical Engineering",
issn = "0091-3286",
publisher = "SPIE",
number = "7",

}

TY - JOUR

T1 - Slab optical waveguides in Er3-doped tellurite glass by N + ion implantation at 1.5 MeV

AU - Berneschi, Simone

AU - Brenci, Massimo

AU - Nunzi Conti, Gualtiero

AU - Pelli, Stefano

AU - Bettinelli, Marco

AU - Speghini, Adolfo

AU - Bnysz, Istvan

AU - Fried, M.

AU - Khanh, Nguyen Q.

AU - Lohner, T.

AU - Petrik, P.

AU - Watterich, A.

AU - Zolnai, Z.

PY - 2011/7

Y1 - 2011/7

N2 - Slab optical waveguides were fabricated in tung-sten-tellurite glass doped with Er3 ions by means of nitrogen ion implantation at 1.5 MeV. A wide range of ion doses (from 51012 to 8.1016 ionscm 2) was used. Optical characterization, performed by dark-line spectroscopy, revealed that the waveguides were of optical barrier type: the implanted layer exhibited a decrease of the refractive index with respect to the virgin bulk glass, while the region comprised between the sample surface and the end of the ion track acted as an optical guiding structure. It was also demonstrated that a post-implantation annealing process, performed at various temperatures on the samples implanted at higher doses, contributes to the reduction of the barrier region.

AB - Slab optical waveguides were fabricated in tung-sten-tellurite glass doped with Er3 ions by means of nitrogen ion implantation at 1.5 MeV. A wide range of ion doses (from 51012 to 8.1016 ionscm 2) was used. Optical characterization, performed by dark-line spectroscopy, revealed that the waveguides were of optical barrier type: the implanted layer exhibited a decrease of the refractive index with respect to the virgin bulk glass, while the region comprised between the sample surface and the end of the ion track acted as an optical guiding structure. It was also demonstrated that a post-implantation annealing process, performed at various temperatures on the samples implanted at higher doses, contributes to the reduction of the barrier region.

KW - Er-doped glass

KW - Er-doped waveguide amplifier

KW - Ion implantation

KW - Slab waveguides

KW - Tellurite glass

UR - http://www.scopus.com/inward/record.url?scp=80455129235&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80455129235&partnerID=8YFLogxK

U2 - 10.1117/1.3559209

DO - 10.1117/1.3559209

M3 - Article

VL - 50

JO - Optical Engineering

JF - Optical Engineering

SN - 0091-3286

IS - 7

M1 - 071110

ER -