Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography

M. Erdélyi, Z. Bor, W. L. Wilson, M. C. Smayling, F. K. Tittel

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The depth of focus (DOF) and the resolution in optical microlithography can be enhanced using coherent multiple imaging (CMI) method. The Fabry-Perot CMI interferometer placed between the mask and the projective lens in a photolithographic system enhances the DOF and resolution. Appropriate pupil-plane filter increases the resolution and DOF by 28% and 150%, respectively.

Original languageEnglish
Pages (from-to)1909-1914
Number of pages6
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume16
Issue number8
Publication statusPublished - Aug 1999

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Optical resolving power
Lithography
Imaging techniques
Interferometers
Masks
Lenses

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography. / Erdélyi, M.; Bor, Z.; Wilson, W. L.; Smayling, M. C.; Tittel, F. K.

In: Journal of the Optical Society of America A: Optics and Image Science, and Vision, Vol. 16, No. 8, 08.1999, p. 1909-1914.

Research output: Contribution to journalArticle

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