Silicon surface preparation and passivation by vapor phase of heavy water

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The well known wet chemical treatments of the silicon surface and its native oxidation in air cause a high density of interface states, which predominantly originate from dangling bonds strained bonds or from bonds, between adsorbates and silicon surface atoms. Therefore, a number of wet-chemical treatments have been developed for ultraclean processing in order to produce chemically and electronically passivated surfaces [1]. The saturation of dangling bonds by hydrogen removes the surface states and replaces them by adsorbate-induced states, which influence the surface band-bending [2]. The first thermal hydrogen desorption peak from a hydrogen passivated Si surface in vacuum or inert gas ambient can be detected at around 380°C [3,4]. Simultaneously the combination of the hydrogen atoms of neighboring dihydrides generates a pair of dangling bonds. At around 480-500°C dangling bonds are generated on the silicon surface by desorption of the remaining hydrogen [5]. At that moment the silicon surface becomes extremely reactive.

Original languageEnglish
Title of host publicationUltra Clean Processing of Semiconductor Surfaces IX
Subtitle of host publicationUCPSS 2008
PublisherTrans Tech Publications Ltd
Pages181-184
Number of pages4
ISBN (Print)3908451647, 9783908451648
DOIs
Publication statusPublished - Jan 1 2009
Event9th international symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2008 - Bruges, Belgium
Duration: Sep 22 2008Sep 24 2008

Publication series

NameSolid State Phenomena
Volume145-146
ISSN (Print)1012-0394

Other

Other9th international symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2008
CountryBelgium
CityBruges
Period9/22/089/24/08

Keywords

  • Deuterium passivation
  • Gas phase
  • Heavy water
  • Si native oxid
  • Wet chemical cleaning

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Silicon surface preparation and passivation by vapor phase of heavy water'. Together they form a unique fingerprint.

  • Cite this

    Pap, A. E., Nényei, Z., Battistig, G., & Bársony, I. (2009). Silicon surface preparation and passivation by vapor phase of heavy water. In Ultra Clean Processing of Semiconductor Surfaces IX: UCPSS 2008 (pp. 181-184). (Solid State Phenomena; Vol. 145-146). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.145-146.181