Silicon oxynitride ECR-PECVD films for integrated optics

P. L. Pernas, E. Ruiz, J. Garrido, J. Piqueras, F. Pászti, A. Climent-Font, G. Litante, E. Cantelar

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

In this work we present results of Si/SiO2/SiON/SiO2 waveguides fabricated by means of ECR-PECVD. In order to change refraction index and simultaneously to reduce losses related with hydrogen, we have used N 2 as precursor gas for controlling the nitrogen to oxygen relation present in the samples. The composition of the samples were carefully controlled by RBS and ERDA analysis. The refractive index and thickness were measured by using a prisma coupler method at a wavelength of 632.8 nm.

Original languageEnglish
Title of host publicationMaterials Science Forum
Pages149-154
Number of pages6
Volume480-481
Publication statusPublished - 2005
Event1st International Meeting on Applied Physics, APHYS-2003 - Badajoz, Spain
Duration: Oct 13 2003Oct 18 2003

Publication series

NameMaterials Science Forum
Volume480-481
ISSN (Print)02555476

Other

Other1st International Meeting on Applied Physics, APHYS-2003
CountrySpain
CityBadajoz
Period10/13/0310/18/03

Fingerprint

Integrated optics
Silicon
Plasma enhanced chemical vapor deposition
Refraction
Hydrogen
Refractive index
Waveguides
Nitrogen
Gases
Oxygen
Wavelength
Chemical analysis
mesoglycan

Keywords

  • ECR
  • ERDA
  • PECVD
  • RBS
  • Silicon oxynitride
  • Waveguides

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Pernas, P. L., Ruiz, E., Garrido, J., Piqueras, J., Pászti, F., Climent-Font, A., ... Cantelar, E. (2005). Silicon oxynitride ECR-PECVD films for integrated optics. In Materials Science Forum (Vol. 480-481, pp. 149-154). (Materials Science Forum; Vol. 480-481).

Silicon oxynitride ECR-PECVD films for integrated optics. / Pernas, P. L.; Ruiz, E.; Garrido, J.; Piqueras, J.; Pászti, F.; Climent-Font, A.; Litante, G.; Cantelar, E.

Materials Science Forum. Vol. 480-481 2005. p. 149-154 (Materials Science Forum; Vol. 480-481).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Pernas, PL, Ruiz, E, Garrido, J, Piqueras, J, Pászti, F, Climent-Font, A, Litante, G & Cantelar, E 2005, Silicon oxynitride ECR-PECVD films for integrated optics. in Materials Science Forum. vol. 480-481, Materials Science Forum, vol. 480-481, pp. 149-154, 1st International Meeting on Applied Physics, APHYS-2003, Badajoz, Spain, 10/13/03.
Pernas PL, Ruiz E, Garrido J, Piqueras J, Pászti F, Climent-Font A et al. Silicon oxynitride ECR-PECVD films for integrated optics. In Materials Science Forum. Vol. 480-481. 2005. p. 149-154. (Materials Science Forum).
Pernas, P. L. ; Ruiz, E. ; Garrido, J. ; Piqueras, J. ; Pászti, F. ; Climent-Font, A. ; Litante, G. ; Cantelar, E. / Silicon oxynitride ECR-PECVD films for integrated optics. Materials Science Forum. Vol. 480-481 2005. pp. 149-154 (Materials Science Forum).
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