Silicon oxynitride ECR-PECVD films for integrated optics

P. L. Pernas, E. Ruiz, J. Garrido, J. Piqueras, F. Paszti, A. Climent-Font, G. Litante, E. Cantelar

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

In this work we present results of Si/SiO2/SiON/SiO2 waveguides fabricated by means of ECR-PECVD. In order to change refraction index and simultaneously to reduce losses related with hydrogen, we have used N 2 as precursor gas for controlling the nitrogen to oxygen relation present in the samples. The composition of the samples were carefully controlled by RBS and ERDA analysis. The refractive index and thickness were measured by using a prisma coupler method at a wavelength of 632.8 nm.

Original languageEnglish
Title of host publicationCross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003)
PublisherTrans Tech Publications Ltd
Pages149-154
Number of pages6
ISBN (Print)0878499628, 9780878499625
Publication statusPublished - Jan 1 2005
Event1st International Meeting on Applied Physics, APHYS-2003 - Badajoz, Spain
Duration: Oct 13 2003Oct 18 2003

Publication series

NameMaterials Science Forum
Volume480-481
ISSN (Print)0255-5476

Other

Other1st International Meeting on Applied Physics, APHYS-2003
CountrySpain
CityBadajoz
Period10/13/0310/18/03

Keywords

  • ECR
  • ERDA
  • PECVD
  • RBS
  • Silicon oxynitride
  • Waveguides

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    Pernas, P. L., Ruiz, E., Garrido, J., Piqueras, J., Paszti, F., Climent-Font, A., Litante, G., & Cantelar, E. (2005). Silicon oxynitride ECR-PECVD films for integrated optics. In Cross-Disciplinary Applied Research in Materials Science and Technology - Proceedings of the 1st International Meeting on Applied Physics, (APHYS-2003) (pp. 149-154). (Materials Science Forum; Vol. 480-481). Trans Tech Publications Ltd.