Sealing of hard CrN and DLC coatings with atomic layer deposition

Emma Härkönen, Ivan Kolev, Belén Díaz, Jolanta Światowska, Vincent Maurice, Antoine Seyeux, Philippe Marcus, Martin Fenker, L. Tóth, G. Radnóczi, Marko Vehkamäki, Mikko Ritala

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) is a thin film deposition technique that is based on alternating and saturating surface reactions of two or more gaseous precursors. The excellent conformality of ALD thin films can be exploited for sealing defects in coatings made by other techniques. Here the corrosion protection properties of hard CrN and diamond-like carbon (DLC) coatings on low alloy steel were improved by ALD sealing with 50 nm thick layers consisting of Al2O3 and Ta2O5 nanolaminates or mixtures. In cross sectional images the ALD layers were found to follow the surface morphology of the CrN coatings uniformly. Furthermore, ALD growth into the pinholes of the CrN coating was verified. In electrochemical measurements the ALD sealing was found to decrease the current density of the CrN coated steel by over 2 orders of magnitude. The neutral salt spray (NSS) durability was also improved: on the best samples the appearance of corrosion spots was delayed from 2 to 168 h. On DLC coatings the adhesion of the ALD sealing layers was weaker, but still clear improvement in NSS durability was achieved indicating sealing of the pinholes.

Original languageEnglish
Pages (from-to)1893-1901
Number of pages9
JournalACS Applied Materials and Interfaces
Volume6
Issue number3
DOIs
Publication statusPublished - Feb 12 2014

Fingerprint

Diamond
Atomic layer deposition
Diamonds
Carbon
Coatings
Durability
Salts
Thin films
Steel
Surface reactions
Corrosion protection
High strength steel
Surface morphology
Current density
Adhesion
Corrosion
Defects

Keywords

  • atomic layer deposition
  • coating
  • corrosion
  • CrN
  • diamond-like carbon
  • sealing

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Härkönen, E., Kolev, I., Díaz, B., Światowska, J., Maurice, V., Seyeux, A., ... Ritala, M. (2014). Sealing of hard CrN and DLC coatings with atomic layer deposition. ACS Applied Materials and Interfaces, 6(3), 1893-1901. https://doi.org/10.1021/am404906x

Sealing of hard CrN and DLC coatings with atomic layer deposition. / Härkönen, Emma; Kolev, Ivan; Díaz, Belén; Światowska, Jolanta; Maurice, Vincent; Seyeux, Antoine; Marcus, Philippe; Fenker, Martin; Tóth, L.; Radnóczi, G.; Vehkamäki, Marko; Ritala, Mikko.

In: ACS Applied Materials and Interfaces, Vol. 6, No. 3, 12.02.2014, p. 1893-1901.

Research output: Contribution to journalArticle

Härkönen, E, Kolev, I, Díaz, B, Światowska, J, Maurice, V, Seyeux, A, Marcus, P, Fenker, M, Tóth, L, Radnóczi, G, Vehkamäki, M & Ritala, M 2014, 'Sealing of hard CrN and DLC coatings with atomic layer deposition', ACS Applied Materials and Interfaces, vol. 6, no. 3, pp. 1893-1901. https://doi.org/10.1021/am404906x
Härkönen E, Kolev I, Díaz B, Światowska J, Maurice V, Seyeux A et al. Sealing of hard CrN and DLC coatings with atomic layer deposition. ACS Applied Materials and Interfaces. 2014 Feb 12;6(3):1893-1901. https://doi.org/10.1021/am404906x
Härkönen, Emma ; Kolev, Ivan ; Díaz, Belén ; Światowska, Jolanta ; Maurice, Vincent ; Seyeux, Antoine ; Marcus, Philippe ; Fenker, Martin ; Tóth, L. ; Radnóczi, G. ; Vehkamäki, Marko ; Ritala, Mikko. / Sealing of hard CrN and DLC coatings with atomic layer deposition. In: ACS Applied Materials and Interfaces. 2014 ; Vol. 6, No. 3. pp. 1893-1901.
@article{67c55985defd46d78a6f508b2f490bfc,
title = "Sealing of hard CrN and DLC coatings with atomic layer deposition",
abstract = "Atomic layer deposition (ALD) is a thin film deposition technique that is based on alternating and saturating surface reactions of two or more gaseous precursors. The excellent conformality of ALD thin films can be exploited for sealing defects in coatings made by other techniques. Here the corrosion protection properties of hard CrN and diamond-like carbon (DLC) coatings on low alloy steel were improved by ALD sealing with 50 nm thick layers consisting of Al2O3 and Ta2O5 nanolaminates or mixtures. In cross sectional images the ALD layers were found to follow the surface morphology of the CrN coatings uniformly. Furthermore, ALD growth into the pinholes of the CrN coating was verified. In electrochemical measurements the ALD sealing was found to decrease the current density of the CrN coated steel by over 2 orders of magnitude. The neutral salt spray (NSS) durability was also improved: on the best samples the appearance of corrosion spots was delayed from 2 to 168 h. On DLC coatings the adhesion of the ALD sealing layers was weaker, but still clear improvement in NSS durability was achieved indicating sealing of the pinholes.",
keywords = "atomic layer deposition, coating, corrosion, CrN, diamond-like carbon, sealing",
author = "Emma H{\"a}rk{\"o}nen and Ivan Kolev and Bel{\'e}n D{\'i}az and Jolanta Światowska and Vincent Maurice and Antoine Seyeux and Philippe Marcus and Martin Fenker and L. T{\'o}th and G. Radn{\'o}czi and Marko Vehkam{\"a}ki and Mikko Ritala",
year = "2014",
month = "2",
day = "12",
doi = "10.1021/am404906x",
language = "English",
volume = "6",
pages = "1893--1901",
journal = "ACS applied materials & interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
number = "3",

}

TY - JOUR

T1 - Sealing of hard CrN and DLC coatings with atomic layer deposition

AU - Härkönen, Emma

AU - Kolev, Ivan

AU - Díaz, Belén

AU - Światowska, Jolanta

AU - Maurice, Vincent

AU - Seyeux, Antoine

AU - Marcus, Philippe

AU - Fenker, Martin

AU - Tóth, L.

AU - Radnóczi, G.

AU - Vehkamäki, Marko

AU - Ritala, Mikko

PY - 2014/2/12

Y1 - 2014/2/12

N2 - Atomic layer deposition (ALD) is a thin film deposition technique that is based on alternating and saturating surface reactions of two or more gaseous precursors. The excellent conformality of ALD thin films can be exploited for sealing defects in coatings made by other techniques. Here the corrosion protection properties of hard CrN and diamond-like carbon (DLC) coatings on low alloy steel were improved by ALD sealing with 50 nm thick layers consisting of Al2O3 and Ta2O5 nanolaminates or mixtures. In cross sectional images the ALD layers were found to follow the surface morphology of the CrN coatings uniformly. Furthermore, ALD growth into the pinholes of the CrN coating was verified. In electrochemical measurements the ALD sealing was found to decrease the current density of the CrN coated steel by over 2 orders of magnitude. The neutral salt spray (NSS) durability was also improved: on the best samples the appearance of corrosion spots was delayed from 2 to 168 h. On DLC coatings the adhesion of the ALD sealing layers was weaker, but still clear improvement in NSS durability was achieved indicating sealing of the pinholes.

AB - Atomic layer deposition (ALD) is a thin film deposition technique that is based on alternating and saturating surface reactions of two or more gaseous precursors. The excellent conformality of ALD thin films can be exploited for sealing defects in coatings made by other techniques. Here the corrosion protection properties of hard CrN and diamond-like carbon (DLC) coatings on low alloy steel were improved by ALD sealing with 50 nm thick layers consisting of Al2O3 and Ta2O5 nanolaminates or mixtures. In cross sectional images the ALD layers were found to follow the surface morphology of the CrN coatings uniformly. Furthermore, ALD growth into the pinholes of the CrN coating was verified. In electrochemical measurements the ALD sealing was found to decrease the current density of the CrN coated steel by over 2 orders of magnitude. The neutral salt spray (NSS) durability was also improved: on the best samples the appearance of corrosion spots was delayed from 2 to 168 h. On DLC coatings the adhesion of the ALD sealing layers was weaker, but still clear improvement in NSS durability was achieved indicating sealing of the pinholes.

KW - atomic layer deposition

KW - coating

KW - corrosion

KW - CrN

KW - diamond-like carbon

KW - sealing

UR - http://www.scopus.com/inward/record.url?scp=84894152677&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84894152677&partnerID=8YFLogxK

U2 - 10.1021/am404906x

DO - 10.1021/am404906x

M3 - Article

VL - 6

SP - 1893

EP - 1901

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

SN - 1944-8244

IS - 3

ER -