Scattered light investigation during LCVD of W from WF6/H2/Ar gas mixture

P. Heszler, JO O. Carlsson

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The intensity of the scattered ArF excimer laser line was measured during photolytic, laser assisted chemical vapour deposition of tungsten from WF6/H2/Ar gas mixtures of different compositions. The scattering was due to nm size tungsten clusters. The scattered light intensity increases, decreases and then increases again as the WF6 partial pressure is increased. The declining part is explained by multiple scattering of the incident light on the tungsten clusters. The intensity of the scattered light was dependent on the noble gas/H2 concentration ratio which determines the thermal conductivity of the WF6/H2/noble gas mixture. The thermal conductivity influenced the lifetime of activated states of the subfluorides and hence the cluster formation and growth rate.

Original languageEnglish
Pages (from-to)955-958
Number of pages4
JournalVacuum
Volume46
Issue number8-10
DOIs
Publication statusPublished - 1995

Fingerprint

Tungsten
Gas mixtures
gas mixtures
Noble Gases
tungsten
Inert gases
rare gases
Thermal conductivity
thermal conductivity
Multiple scattering
Excimer lasers
scattering
Partial pressure
excimer lasers
luminous intensity
partial pressure
Chemical vapor deposition
vapor deposition
Scattering
life (durability)

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Instrumentation
  • Surfaces and Interfaces

Cite this

Scattered light investigation during LCVD of W from WF6/H2/Ar gas mixture. / Heszler, P.; Carlsson, JO O.

In: Vacuum, Vol. 46, No. 8-10, 1995, p. 955-958.

Research output: Contribution to journalArticle

Heszler, P. ; Carlsson, JO O. / Scattered light investigation during LCVD of W from WF6/H2/Ar gas mixture. In: Vacuum. 1995 ; Vol. 46, No. 8-10. pp. 955-958.
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