RF thermal plasma processing of fullerenes

B. Todorović-Marković, Z. Marković, I. Mohai, Z. Nikolić, Z. Farkas, J. Szépvölgyi, É Kováts, P. Scheier, S. Feil

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

This paper presents results on fullerene formation during the processing of different graphite powders in an RF thermal plasma reactor. Graphite powders of different particle size and purity were fed into the reactor (Aldrich, KS4). Optical emission spectroscopy of atomic and molecular species is used as a diagnostic tool of the RF plasma flame. It was found that rotational and vibrational temperatures of C2 radicals depend on the feed rate of the precursor used. The volumes of RF plasma flame during processing of graphite powders have been calculated. By analysing scanning electron microscopy micrographs of soot, the evaporation rate of the precursors used has been evaluated as well. Based on the obtained values of volumes of plasma flame and evaporation rate of starting powders, the concentration of C2 radicals has been calculated.

Original languageEnglish
Pages (from-to)320-326
Number of pages7
JournalJournal of Physics D: Applied Physics
Volume39
Issue number2
DOIs
Publication statusPublished - Jan 21 2006

Fingerprint

Plasma Gases
Fullerenes
Plasma applications
thermal plasmas
Powders
fullerenes
Graphite
Plasmas
flames
evaporation rate
graphite
Evaporation
reactors
Soot
Optical emission spectroscopy
optical emission spectroscopy
soot
Processing
purity
Particle size

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Todorović-Marković, B., Marković, Z., Mohai, I., Nikolić, Z., Farkas, Z., Szépvölgyi, J., ... Feil, S. (2006). RF thermal plasma processing of fullerenes. Journal of Physics D: Applied Physics, 39(2), 320-326. https://doi.org/10.1088/0022-3727/39/2/012

RF thermal plasma processing of fullerenes. / Todorović-Marković, B.; Marković, Z.; Mohai, I.; Nikolić, Z.; Farkas, Z.; Szépvölgyi, J.; Kováts, É; Scheier, P.; Feil, S.

In: Journal of Physics D: Applied Physics, Vol. 39, No. 2, 21.01.2006, p. 320-326.

Research output: Contribution to journalArticle

Todorović-Marković, B, Marković, Z, Mohai, I, Nikolić, Z, Farkas, Z, Szépvölgyi, J, Kováts, É, Scheier, P & Feil, S 2006, 'RF thermal plasma processing of fullerenes', Journal of Physics D: Applied Physics, vol. 39, no. 2, pp. 320-326. https://doi.org/10.1088/0022-3727/39/2/012
Todorović-Marković, B. ; Marković, Z. ; Mohai, I. ; Nikolić, Z. ; Farkas, Z. ; Szépvölgyi, J. ; Kováts, É ; Scheier, P. ; Feil, S. / RF thermal plasma processing of fullerenes. In: Journal of Physics D: Applied Physics. 2006 ; Vol. 39, No. 2. pp. 320-326.
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