Resistivity Measurements on Amorphous NiP Alloys Prepared by Different Techniques

L. K. Varga, T. Schmidt

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

High temperature resistivity and its temperature coefficient data between 77 and 770 K are reported on Ni100−xPx amorphous alloys in a large concentration range (11<x<25) prepared by three different techniques, viz. chemical reduction, electrodeposition, and melt quenching. The results are the same for each kind of alloys with the same chemical composition provided the samples are free from inhomogeneities. The remnant crystals increases, whereas a small amount of magnetic inhomogeneities decreases the TCR. The presence of inhomogeneities reduces the thermal stability as can be observed from resistivity change during the crystallization.

Original languageEnglish
Pages (from-to)279-283
Number of pages5
Journalphysica status solidi (a)
Volume74
Issue number1
DOIs
Publication statusPublished - Nov 16 1982

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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