Report on the 47th IUVSTAworkshop 'angle-resolved XPS: The current status and future prospects for angle-resolved XPS of nano and subnano films'

A. Herrera-Gomez, J. T. Grant, P. J. Cumpson, M. Jenko, F. S. Aguirre-Tostado, C. R. Brundle, T. Conard, G. Conti, C. S. Fadley, J. Fulghum, K. Kobayashi, L. Kövér, H. Nohira, R. L. Opila, S. Oswald, R. W. Paynter, R. M. Wallace, W. S M Werner, J. Wolstenholme

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

A summary of the workshop entitled 'Angle-Resolved XPS: The Current Status and Future Prospects for Angle-resolved XPS of Nano and Subnano Films' is given, which was held at the Riviera Maya, Mexico, 26-30March 2007, under the main sponsorship of the International Union for Vacuum Science, Technique and Applications (IUVSTA). Angle-resolved X-ray photoelectron spectroscopy (ARXPS) can provide detailed chemical as well as depth profile information about the near-surface composition of materials and thin films. This workshop was held to review the present status and level of understanding of Angle-resolved XPS, and to stimulate discussions leading to a deeper understanding of current problems and new solutions. The main goal of the workshop was to find better ways to perform experiments and, very importantly, better ways to extract information from the experimental data. This report contains summaries of presentations and discussions that were held in sessions entitled 'Basics and Present Limits of ARXPS', the Analysis of ARXPS Data, Applications of ARXPS, Equipment for ARXPS, and Future Developments in ARXPS'. There were 33 participants at the workshop.

Original languageEnglish
Pages (from-to)840-857
Number of pages18
JournalSurface and Interface Analysis
Volume41
Issue number11
DOIs
Publication statusPublished - Nov 2009

Fingerprint

X ray photoelectron spectroscopy
photoelectron spectroscopy
x rays
Mexico
Surface structure
Vacuum
Thin films
vacuum
thin films
profiles
Experiments

Keywords

  • Angle-resolved X-ray photoelectron spectroscopy
  • ARXPS
  • Hard X-ray photoemission
  • IUVSTA workshop
  • Maximum entropy
  • Near-surface analysis
  • Non-destructive depth profiling
  • Stratification
  • Surface analysis
  • X-ray photoelectron spectroscopy
  • XPS

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Materials Chemistry
  • Surfaces, Coatings and Films

Cite this

Herrera-Gomez, A., Grant, J. T., Cumpson, P. J., Jenko, M., Aguirre-Tostado, F. S., Brundle, C. R., ... Wolstenholme, J. (2009). Report on the 47th IUVSTAworkshop 'angle-resolved XPS: The current status and future prospects for angle-resolved XPS of nano and subnano films'. Surface and Interface Analysis, 41(11), 840-857. https://doi.org/10.1002/sia.3105

Report on the 47th IUVSTAworkshop 'angle-resolved XPS : The current status and future prospects for angle-resolved XPS of nano and subnano films'. / Herrera-Gomez, A.; Grant, J. T.; Cumpson, P. J.; Jenko, M.; Aguirre-Tostado, F. S.; Brundle, C. R.; Conard, T.; Conti, G.; Fadley, C. S.; Fulghum, J.; Kobayashi, K.; Kövér, L.; Nohira, H.; Opila, R. L.; Oswald, S.; Paynter, R. W.; Wallace, R. M.; Werner, W. S M; Wolstenholme, J.

In: Surface and Interface Analysis, Vol. 41, No. 11, 11.2009, p. 840-857.

Research output: Contribution to journalArticle

Herrera-Gomez, A, Grant, JT, Cumpson, PJ, Jenko, M, Aguirre-Tostado, FS, Brundle, CR, Conard, T, Conti, G, Fadley, CS, Fulghum, J, Kobayashi, K, Kövér, L, Nohira, H, Opila, RL, Oswald, S, Paynter, RW, Wallace, RM, Werner, WSM & Wolstenholme, J 2009, 'Report on the 47th IUVSTAworkshop 'angle-resolved XPS: The current status and future prospects for angle-resolved XPS of nano and subnano films'', Surface and Interface Analysis, vol. 41, no. 11, pp. 840-857. https://doi.org/10.1002/sia.3105
Herrera-Gomez, A. ; Grant, J. T. ; Cumpson, P. J. ; Jenko, M. ; Aguirre-Tostado, F. S. ; Brundle, C. R. ; Conard, T. ; Conti, G. ; Fadley, C. S. ; Fulghum, J. ; Kobayashi, K. ; Kövér, L. ; Nohira, H. ; Opila, R. L. ; Oswald, S. ; Paynter, R. W. ; Wallace, R. M. ; Werner, W. S M ; Wolstenholme, J. / Report on the 47th IUVSTAworkshop 'angle-resolved XPS : The current status and future prospects for angle-resolved XPS of nano and subnano films'. In: Surface and Interface Analysis. 2009 ; Vol. 41, No. 11. pp. 840-857.
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