Related electrical and metallurgical properties of Pd/Zn/Pd/Ge and Pd/Zn/Pd/Au contact systems to p-InGaP

V. Malina, K. Vogel, P. Ressel, B. Pécz, L. Dobos

Research output: Contribution to journalArticle

Abstract

The comparison of electrical and metallurgical properties of vacuum-evaporated Ge/Pd(Zn) and Au/Pd(Zn) contact metallizations to moderately doped p-type InGaP epitaxial layers (p ≈ 2 × 1018 cm-3) is presented. The Pd/Zn/Pd/Ge contacts exhibited Ohmic behaviour already from 400°C and their specific contact resistance dropped to 4 × 10-5 Ω cm2 when annealed at 490°C. Cross-sectional transmission electron microscopy and energy dispersive X-ray spectrometry demonstrated that a relatively sharp and nonspiking contact-InGaP interface has still been preserved at this high temperature. On the other hand, regardless of the excellent electrical properties (ρc= 5 × 10-6 Ω cm2 at 490°C) of the Pd/Zn/Pd/Au contacts, strong metallurgical reactions at the contact-InGaP interface at temperatures ≥450°C resulted in an extensive decomposition and melting of the interface area with deep protrusions into the InGaP.

Original languageEnglish
Pages (from-to)139-144
Number of pages6
JournalPhysica Status Solidi (A) Applied Research
Volume184
Issue number1
DOIs
Publication statusPublished - Mar 1 2001

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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