Refractometry of weakly absorbing multilayers via reflectometry

E. Lörincz, Róbert Klug

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Simple reflection techniques for optical parameter determination of isotropic or anisotropic multilayers on a lower refractive index substrate are presented here. In case of weak absorption in at least one of the layers characteristic minima appear in the angular dependence of the reflectivity by computer fit of which the layer refractive indices and thicknesses can be determined. In case of a monolayer the achieved accuracy is better than the third and fourth decimal in the real and imaginary part of the refraction index, respectively. The fit of bi-layers has lower accuracy, but has the advantage of refractive index determination of non-absorbing layer(s) in the presence of a weakly absorbing auxiliary layer. Comparison between measured refractive indices by reflectometric and optical waveguiding methods shows agreement within 0.001.

Original languageEnglish
Title of host publicationRefractometry
PublisherSPIE
Pages164-173
Number of pages10
Volume2208
ISBN (Electronic)9780819417060
DOIs
Publication statusPublished - Jun 23 1995
EventRefractometry - Warsaw, Poland
Duration: May 16 1994May 20 1994

Other

OtherRefractometry
CountryPoland
CityWarsaw
Period5/16/945/20/94

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Lörincz, E., & Klug, R. (1995). Refractometry of weakly absorbing multilayers via reflectometry. In Refractometry (Vol. 2208, pp. 164-173). SPIE. https://doi.org/10.1117/12.213186