Reducing the incubation effects for rear side laser etching of fused silica

Klaus Zimmer, Martin Ehrhardt, Pierre Lorenz, Xi Wang, C. Vass, Tamás Csizmadia, B. Hopp

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Laser-induced back side wet and dry etching (LIBWE and LIBDE) were developed for precise etching of transparent materials. However, LIBWE and LIBDE feature characteristics such as incubation effects and etching depth saturation, respectively, that can be unfavourable for applications in ultra-precision machining. Therefore, the techniques of LIBDE and LIBWE were combined in such a manner that the dielectric material was supplied with a thin-film-modified surface before etching by LIBWE. With this goal fused silica samples were covered with a thin chromium film for surface modification before LIBWE etching in acetone with 25 ns KrF excimer laser pulses. Etching with the first pulse was observed. At laser fluences adequate for hydrocarbon LIBWE (1 J/cm2) the etching rate for LIBDE is much higher than for LIBWE. In consequence, the etching rate decreases with increasing pulse number up to ten. The surface morphology depends very strong on the laser fluence and the pulse number. Smooth etchings were achieved at high fluences and low pulse numbers. However, uneven, wavy etched surfaces and micron pattern formation were observed for moderate and low laser fluences.

Original languageEnglish
Pages (from-to)42-45
Number of pages4
JournalApplied Surface Science
Volume302
DOIs
Publication statusPublished - May 30 2014

Fingerprint

Fused silica
Etching
Lasers
Laser pulses
Dry etching
Wet etching
Excimer lasers
Chromium
Hydrocarbons
Acetone
Surface morphology
Surface treatment
Machining
Thin films

Keywords

  • Fused silica
  • Incubation effect
  • Laser etching
  • LIBDE
  • LIBWE

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Reducing the incubation effects for rear side laser etching of fused silica. / Zimmer, Klaus; Ehrhardt, Martin; Lorenz, Pierre; Wang, Xi; Vass, C.; Csizmadia, Tamás; Hopp, B.

In: Applied Surface Science, Vol. 302, 30.05.2014, p. 42-45.

Research output: Contribution to journalArticle

Zimmer, Klaus ; Ehrhardt, Martin ; Lorenz, Pierre ; Wang, Xi ; Vass, C. ; Csizmadia, Tamás ; Hopp, B. / Reducing the incubation effects for rear side laser etching of fused silica. In: Applied Surface Science. 2014 ; Vol. 302. pp. 42-45.
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