Reactivity of amorphous and intermetallic Al-Pt phases with Pt vapour beam

A. Kovács, P. Barna

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Formation of phases developing by solid-state reaction in Al thin film and Pt vapour beam is reported. The samples have been studied by high temperature sequential deposition (HTSD) [Mat. Sci. Forum, 22-24 (1987) 617]. The Al and Pt were deposited by e-beam evaporation on a-C layers supported by TEM microgrids in an UHV system. A special evaporation arrangement made possible to visualise the sequentially forming phases side by side by creating wedge-shaped area with increasing Al film thickness in the half shadow of the sample holder. By changing the quantity of elements available for the reaction the sequences of intermetallic Al3Pt2, AlPt2, and AlPt3 phases have been found. The samples were investigated by electron microscopy techniques (TEM, SAED, EDS). The electron diffraction patterns have been evaluated by the ProcessDiffraction program [J.L. Lábár in Proc. XII. EUREM, Brno, July 9-14, 2000, I 379].

Original languageEnglish
Pages (from-to)105-108
Number of pages4
JournalSolid State Ionics
Volume141-142
DOIs
Publication statusPublished - May 1 2001

Fingerprint

Intermetallics
intermetallics
Evaporation
reactivity
Vapors
vapors
Transmission electron microscopy
Solid state reactions
evaporation
Electron diffraction
Diffraction patterns
Electron microscopy
Film thickness
Energy dispersive spectroscopy
transmission electron microscopy
holders
Thin films
wedges
electron microscopy
film thickness

Keywords

  • Al-Pt
  • Intermetallic phases
  • Sequence of phase formation
  • TEM
  • Thin film

ASJC Scopus subject areas

  • Electrochemistry
  • Physical and Theoretical Chemistry
  • Energy Engineering and Power Technology
  • Materials Chemistry
  • Condensed Matter Physics

Cite this

Reactivity of amorphous and intermetallic Al-Pt phases with Pt vapour beam. / Kovács, A.; Barna, P.

In: Solid State Ionics, Vol. 141-142, 01.05.2001, p. 105-108.

Research output: Contribution to journalArticle

@article{4847c2a2f0884a98b057a3b6cb3bddad,
title = "Reactivity of amorphous and intermetallic Al-Pt phases with Pt vapour beam",
abstract = "Formation of phases developing by solid-state reaction in Al thin film and Pt vapour beam is reported. The samples have been studied by high temperature sequential deposition (HTSD) [Mat. Sci. Forum, 22-24 (1987) 617]. The Al and Pt were deposited by e-beam evaporation on a-C layers supported by TEM microgrids in an UHV system. A special evaporation arrangement made possible to visualise the sequentially forming phases side by side by creating wedge-shaped area with increasing Al film thickness in the half shadow of the sample holder. By changing the quantity of elements available for the reaction the sequences of intermetallic Al3Pt2, AlPt2, and AlPt3 phases have been found. The samples were investigated by electron microscopy techniques (TEM, SAED, EDS). The electron diffraction patterns have been evaluated by the ProcessDiffraction program [J.L. L{\'a}b{\'a}r in Proc. XII. EUREM, Brno, July 9-14, 2000, I 379].",
keywords = "Al-Pt, Intermetallic phases, Sequence of phase formation, TEM, Thin film",
author = "A. Kov{\'a}cs and P. Barna",
year = "2001",
month = "5",
day = "1",
doi = "10.1016/S0167-2738(01)00728-7",
language = "English",
volume = "141-142",
pages = "105--108",
journal = "Solid State Ionics",
issn = "0167-2738",
publisher = "Elsevier",

}

TY - JOUR

T1 - Reactivity of amorphous and intermetallic Al-Pt phases with Pt vapour beam

AU - Kovács, A.

AU - Barna, P.

PY - 2001/5/1

Y1 - 2001/5/1

N2 - Formation of phases developing by solid-state reaction in Al thin film and Pt vapour beam is reported. The samples have been studied by high temperature sequential deposition (HTSD) [Mat. Sci. Forum, 22-24 (1987) 617]. The Al and Pt were deposited by e-beam evaporation on a-C layers supported by TEM microgrids in an UHV system. A special evaporation arrangement made possible to visualise the sequentially forming phases side by side by creating wedge-shaped area with increasing Al film thickness in the half shadow of the sample holder. By changing the quantity of elements available for the reaction the sequences of intermetallic Al3Pt2, AlPt2, and AlPt3 phases have been found. The samples were investigated by electron microscopy techniques (TEM, SAED, EDS). The electron diffraction patterns have been evaluated by the ProcessDiffraction program [J.L. Lábár in Proc. XII. EUREM, Brno, July 9-14, 2000, I 379].

AB - Formation of phases developing by solid-state reaction in Al thin film and Pt vapour beam is reported. The samples have been studied by high temperature sequential deposition (HTSD) [Mat. Sci. Forum, 22-24 (1987) 617]. The Al and Pt were deposited by e-beam evaporation on a-C layers supported by TEM microgrids in an UHV system. A special evaporation arrangement made possible to visualise the sequentially forming phases side by side by creating wedge-shaped area with increasing Al film thickness in the half shadow of the sample holder. By changing the quantity of elements available for the reaction the sequences of intermetallic Al3Pt2, AlPt2, and AlPt3 phases have been found. The samples were investigated by electron microscopy techniques (TEM, SAED, EDS). The electron diffraction patterns have been evaluated by the ProcessDiffraction program [J.L. Lábár in Proc. XII. EUREM, Brno, July 9-14, 2000, I 379].

KW - Al-Pt

KW - Intermetallic phases

KW - Sequence of phase formation

KW - TEM

KW - Thin film

UR - http://www.scopus.com/inward/record.url?scp=0035330348&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035330348&partnerID=8YFLogxK

U2 - 10.1016/S0167-2738(01)00728-7

DO - 10.1016/S0167-2738(01)00728-7

M3 - Article

VL - 141-142

SP - 105

EP - 108

JO - Solid State Ionics

JF - Solid State Ionics

SN - 0167-2738

ER -