Reactivity of amorphous and intermetallic Al-Pt phases with Pt vapour beam

A. Kovács, P. B. Barna

Research output: Contribution to journalConference article

6 Citations (Scopus)

Abstract

Formation of phases developing by solid-state reaction in Al thin film and Pt vapour beam is reported. The samples have been studied by high temperature sequential deposition (HTSD) [Mat. Sci. Forum, 22-24 (1987) 617]. The Al and Pt were deposited by e-beam evaporation on a-C layers supported by TEM microgrids in an UHV system. A special evaporation arrangement made possible to visualise the sequentially forming phases side by side by creating wedge-shaped area with increasing Al film thickness in the half shadow of the sample holder. By changing the quantity of elements available for the reaction the sequences of intermetallic Al3Pt2, AlPt2, and AlPt3 phases have been found. The samples were investigated by electron microscopy techniques (TEM, SAED, EDS). The electron diffraction patterns have been evaluated by the ProcessDiffraction program [J.L. Lábár in Proc. XII. EUREM, Brno, July 9-14, 2000, I 379].

Original languageEnglish
Pages (from-to)105-108
Number of pages4
JournalSolid State Ionics
Volume141-142
DOIs
Publication statusPublished - May 1 2001
Event14th Intenational Symposium on the Reactivity of Solids - Budapest, Hungary
Duration: Aug 27 2000Aug 31 2000

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Keywords

  • Al-Pt
  • Intermetallic phases
  • Sequence of phase formation
  • TEM
  • Thin film

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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