Strain-induced, self-assembled iron silicide nanostructures were grown on Si(001) substrate by reactive deposition epitaxy. The phases and structures were characterized by scanning- and transmission electron microscopy, atomic force microscopy, and by Fourier transform infrared spectroscopy. The electrical characteristics were investigated by I-V and C-V measurements and the point defects were measured by DLTS. The size and shape of the nanoislands depended on the initial Fe thickness and on the annealing. Coexistence of different iron silicide phases was detected. Electrical characteristics show large defect concentration related to Fe.
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