Reaction of CH2 with adsorbed O on Ru(001) surface

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Abstract

The reaction pathways of CH2 in the presence of coadsorbed oxygen atoms on Ru(001) surface were investigated by means of temperature-programmed desorption (TPD), photoelectron spectroscopy (XPS and UPS) and work function measurements. CH2 species were produced by thermal and photoinduced dissociation of CH2I2. Preadsorbed oxygen atoms markedly stabilized C-I bonds, shifted the desorption of CH2I2 to higher temperatures and reacted with CH2 formed to give formaldehyde above 200 K. Adsorbed formate was also detected in the temperature range of 300-450 K. The oxidation of surface species (CH2O, HCOO, CxHy) proceeded above 450 K, to produce CO, CO2, and H2O. Illumination of the (CH2I2+O) coadsorbed layer initiated the dissociation of CH2I2, and induced the reaction of CH2 with O slightly above 110 K.

Original languageEnglish
Pages (from-to)149-160
Number of pages12
JournalSurface Science
Volume459
Issue number1
DOIs
Publication statusPublished - Jul 1 2000

Fingerprint

formic acid
oxygen atoms
desorption
dissociation
Oxygen
thermal dissociation
Atoms
formates
Carbon Monoxide
Temperature programmed desorption
Photoelectron spectroscopy
formaldehyde
Formaldehyde
Desorption
X ray photoelectron spectroscopy
Lighting
illumination
photoelectron spectroscopy
Oxidation
Temperature

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Reaction of CH2 with adsorbed O on Ru(001) surface. / Kis, A.; Kiss, J.; Solymosi, F.

In: Surface Science, Vol. 459, No. 1, 01.07.2000, p. 149-160.

Research output: Contribution to journalArticle

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