Pulsed laser ablative deposition of thin metal films

P. Mogyorósi, T. Szörényi, K. Bali, Z. Tóth, I. Hevesi

Research output: Contribution to journalArticle

47 Citations (Scopus)

Abstract

Different mechanisms of pulsed laser ablation and ablative deposition of thin metal films at various fluences are discussed. The window for clear ablation, i.e. the fluence range in which the film is completely removed without any damage of the supporting substrate and the window for best quality printing are determined.

Original languageEnglish
Pages (from-to)157-163
Number of pages7
JournalApplied Surface Science
Volume36
Issue number1-4
DOIs
Publication statusPublished - 1989

Fingerprint

Pulsed lasers
metal films
pulsed lasers
fluence
Metals
Laser ablation
Ablation
printing
laser ablation
ablation
Printing
damage
Substrates

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

Pulsed laser ablative deposition of thin metal films. / Mogyorósi, P.; Szörényi, T.; Bali, K.; Tóth, Z.; Hevesi, I.

In: Applied Surface Science, Vol. 36, No. 1-4, 1989, p. 157-163.

Research output: Contribution to journalArticle

Mogyorósi, P. ; Szörényi, T. ; Bali, K. ; Tóth, Z. ; Hevesi, I. / Pulsed laser ablative deposition of thin metal films. In: Applied Surface Science. 1989 ; Vol. 36, No. 1-4. pp. 157-163.
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