Pulsed laser ablative deposition of thin metal films

P. Mogyorósi, T. Szörényi, K. Bali, Zs Tóth, I. Hevesi

Research output: Contribution to journalArticle

48 Citations (Scopus)

Abstract

Different mechanisms of pulsed laser ablation and ablative deposition of thin metal films at various fluences are discussed. The window for clear ablation, i.e. the fluence range in which the film is completely removed without any damage of the supporting substrate and the window for best quality printing are determined.

Original languageEnglish
Pages (from-to)157-163
Number of pages7
JournalApplied Surface Science
Volume36
Issue number1-4
DOIs
Publication statusPublished - 1989

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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