Proton beam micromachining on strippable aqueous base developable negative resist

I. Rajta, E. Baradács, M. Chatzichristidi, E. S. Valamontes, I. Uzonyi, I. Raptis

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Nowadays a significant amount of research effort is devoted to the development of technologies for the fabrication of microcomponents and microsystems worldwide. In certain applications of micromachining high aspect ratio (HAR) structures are required. However, the resist materials used in HAR technologies are usually not compatible with the IC fabrication, either because they cannot be stripped away or because they are developed in organic solvents. In the present work the application of a novel chemically amplified resist for proton beam micromachining is presented. The resist based on epoxy and polyhydroxystyrene polymers is developed in the IC standard aqueous developers. The exposed areas can be stripped away using conventional organic stripping solutions. In order to test the exposure dose sensitivity and the lateral resolution, various test structures were irradiated. Using this formulation 5-8 μm wide lines with aspect ratio 4-6 were resolved.

Original languageEnglish
Pages (from-to)423-427
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume231
Issue number1-4
DOIs
Publication statusPublished - Apr 2005

Fingerprint

Proton beams
Micromachining
micromachining
high aspect ratio
proton beams
Aspect ratio
fabrication
photographic developers
stripping
aspect ratio
Fabrication
Microsystems
formulations
dosage
Organic solvents
sensitivity
Polymers
polymers

Keywords

  • Epoxy and polystyrene based chemically amplified polymer resists
  • High aspect ratio technologies
  • Proton beam micromachining

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

Proton beam micromachining on strippable aqueous base developable negative resist. / Rajta, I.; Baradács, E.; Chatzichristidi, M.; Valamontes, E. S.; Uzonyi, I.; Raptis, I.

In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 231, No. 1-4, 04.2005, p. 423-427.

Research output: Contribution to journalArticle

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