Proton beam lithography in negative tone liquid phase PDMS polymer resist

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7 Citations (Scopus)

Abstract

In this work we investigated the applicability of liquid PDMS polymer as a negative resist material for direct proton beam writing technique. We irradiated the polymer in liquid phase, spin-coated on different substrate materials creating various microstructures. PDMS pre-polymer was cross-linked just by PBW. As the cross-linking process increases, the irradiated area becomes more solid. The rate of the solidification strongly depends on the deposited ion dose. The effects of fluence, beam current, substrate type and developer solvent was investigated. Furthermore, at the irradiated areas the adhesion, the wettability and Young's modulus also changes due to the chemical change of the PDMS polymer. This effect makes the possibility to form microstructures in PDMS with tunable adhesion and wettability properties. In practical viewpoint, the PDMS resist can also have some advantages compared to other resists such as easy stripping, very fast developing (as the un-cross-linked PDMS is soluble in many organic solvents), not sensitive to light, high current or high fluence.

Original languageEnglish
Pages (from-to)213-217
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume348
DOIs
Publication statusPublished - Jan 1 2015

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Proton beams
proton beams
Lithography
liquid phases
lithography
polymers
Liquids
Polymers
wettability
Wetting
fluence
adhesion
Adhesion
microstructure
Microstructure
photographic developers
Substrates
beam currents
stripping
Organic solvents

Keywords

  • Negative resist
  • PDMS
  • Proton beam writing
  • Silicate microstructures

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

Cite this

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title = "Proton beam lithography in negative tone liquid phase PDMS polymer resist",
abstract = "In this work we investigated the applicability of liquid PDMS polymer as a negative resist material for direct proton beam writing technique. We irradiated the polymer in liquid phase, spin-coated on different substrate materials creating various microstructures. PDMS pre-polymer was cross-linked just by PBW. As the cross-linking process increases, the irradiated area becomes more solid. The rate of the solidification strongly depends on the deposited ion dose. The effects of fluence, beam current, substrate type and developer solvent was investigated. Furthermore, at the irradiated areas the adhesion, the wettability and Young's modulus also changes due to the chemical change of the PDMS polymer. This effect makes the possibility to form microstructures in PDMS with tunable adhesion and wettability properties. In practical viewpoint, the PDMS resist can also have some advantages compared to other resists such as easy stripping, very fast developing (as the un-cross-linked PDMS is soluble in many organic solvents), not sensitive to light, high current or high fluence.",
keywords = "Negative resist, PDMS, Proton beam writing, Silicate microstructures",
author = "R. Husz{\'a}nk and I. Rajta and C. Cserh{\'a}ti",
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T1 - Proton beam lithography in negative tone liquid phase PDMS polymer resist

AU - Huszánk, R.

AU - Rajta, I.

AU - Cserháti, C.

PY - 2015/1/1

Y1 - 2015/1/1

N2 - In this work we investigated the applicability of liquid PDMS polymer as a negative resist material for direct proton beam writing technique. We irradiated the polymer in liquid phase, spin-coated on different substrate materials creating various microstructures. PDMS pre-polymer was cross-linked just by PBW. As the cross-linking process increases, the irradiated area becomes more solid. The rate of the solidification strongly depends on the deposited ion dose. The effects of fluence, beam current, substrate type and developer solvent was investigated. Furthermore, at the irradiated areas the adhesion, the wettability and Young's modulus also changes due to the chemical change of the PDMS polymer. This effect makes the possibility to form microstructures in PDMS with tunable adhesion and wettability properties. In practical viewpoint, the PDMS resist can also have some advantages compared to other resists such as easy stripping, very fast developing (as the un-cross-linked PDMS is soluble in many organic solvents), not sensitive to light, high current or high fluence.

AB - In this work we investigated the applicability of liquid PDMS polymer as a negative resist material for direct proton beam writing technique. We irradiated the polymer in liquid phase, spin-coated on different substrate materials creating various microstructures. PDMS pre-polymer was cross-linked just by PBW. As the cross-linking process increases, the irradiated area becomes more solid. The rate of the solidification strongly depends on the deposited ion dose. The effects of fluence, beam current, substrate type and developer solvent was investigated. Furthermore, at the irradiated areas the adhesion, the wettability and Young's modulus also changes due to the chemical change of the PDMS polymer. This effect makes the possibility to form microstructures in PDMS with tunable adhesion and wettability properties. In practical viewpoint, the PDMS resist can also have some advantages compared to other resists such as easy stripping, very fast developing (as the un-cross-linked PDMS is soluble in many organic solvents), not sensitive to light, high current or high fluence.

KW - Negative resist

KW - PDMS

KW - Proton beam writing

KW - Silicate microstructures

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