Properties of the most frequently applied conventional layer components are surveyed and the optical properties of SiO//x and TiO//2 mono-layers and those of thin-layer mirrors consisting of these two components are investigated depending on the production parameters. The analyzed layers were prepared in a reactive way in oxygen atmosphere by evaporation with resistance heating. The increase of the reflection and of the breadth of the reflection band with subsequent annealing are discussed. The possibilities of a wide application of thin-layer systems produced of the two investigated materials in the light source production are referred to in connection with the high mechanical, thermal and chemical stability of these materials.
|Number of pages||7|
|Journal||Tungsram Tech Mitt|
|Publication status||Published - Jan 1 1978|
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