Production of highly charged Xe ions from the RIKEN 18 GHz electron cyclotron resonance ion source using a biased electrode

Takahide Nakagawa, S. Biri, Masanori Kidera, Yoshitoshi Miyazawa, Masatake Hemmi, Toshiya Chiba, Naohito Inabe, Masayuki Kase, Tadashi Kageyama, Osamu Kamigaito, Akira Goto, Yasushige Yano

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We have observed the enhancement of Xe30,32+ ion beam intensity from the RIKEN 18 GHz electron cyclotron resonance ion source (ECRIS) using an electrode at bias voltage of ∼ -100 V. We have successfully obtained beam intensities of 11 eμA for the Xe30+ ion beam and 4 eμA for the Xe32+ ion beam using this method at an extraction voltage of 13 kV.

Original languageEnglish
Pages (from-to)6215-6216
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume37
Issue number11
Publication statusPublished - Nov 1998

Fingerprint

Electron cyclotron resonance
Ion sources
electron cyclotron resonance
ion sources
Ion beams
ion beams
Electrodes
electrodes
Ions
ions
electric potential
Bias voltage
augmentation
Electric potential

Keywords

  • Biased electrode
  • Electron cyclotron resonance ion source (ECRIS)
  • Extraction voltage
  • Microwave power
  • Xe ion

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Engineering(all)

Cite this

Production of highly charged Xe ions from the RIKEN 18 GHz electron cyclotron resonance ion source using a biased electrode. / Nakagawa, Takahide; Biri, S.; Kidera, Masanori; Miyazawa, Yoshitoshi; Hemmi, Masatake; Chiba, Toshiya; Inabe, Naohito; Kase, Masayuki; Kageyama, Tadashi; Kamigaito, Osamu; Goto, Akira; Yano, Yasushige.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 37, No. 11, 11.1998, p. 6215-6216.

Research output: Contribution to journalArticle

Nakagawa, T, Biri, S, Kidera, M, Miyazawa, Y, Hemmi, M, Chiba, T, Inabe, N, Kase, M, Kageyama, T, Kamigaito, O, Goto, A & Yano, Y 1998, 'Production of highly charged Xe ions from the RIKEN 18 GHz electron cyclotron resonance ion source using a biased electrode', Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, vol. 37, no. 11, pp. 6215-6216.
Nakagawa, Takahide ; Biri, S. ; Kidera, Masanori ; Miyazawa, Yoshitoshi ; Hemmi, Masatake ; Chiba, Toshiya ; Inabe, Naohito ; Kase, Masayuki ; Kageyama, Tadashi ; Kamigaito, Osamu ; Goto, Akira ; Yano, Yasushige. / Production of highly charged Xe ions from the RIKEN 18 GHz electron cyclotron resonance ion source using a biased electrode. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 1998 ; Vol. 37, No. 11. pp. 6215-6216.
@article{bbd9402d18204a44ad25a6451cc98e8c,
title = "Production of highly charged Xe ions from the RIKEN 18 GHz electron cyclotron resonance ion source using a biased electrode",
abstract = "We have observed the enhancement of Xe30,32+ ion beam intensity from the RIKEN 18 GHz electron cyclotron resonance ion source (ECRIS) using an electrode at bias voltage of ∼ -100 V. We have successfully obtained beam intensities of 11 eμA for the Xe30+ ion beam and 4 eμA for the Xe32+ ion beam using this method at an extraction voltage of 13 kV.",
keywords = "Biased electrode, Electron cyclotron resonance ion source (ECRIS), Extraction voltage, Microwave power, Xe ion",
author = "Takahide Nakagawa and S. Biri and Masanori Kidera and Yoshitoshi Miyazawa and Masatake Hemmi and Toshiya Chiba and Naohito Inabe and Masayuki Kase and Tadashi Kageyama and Osamu Kamigaito and Akira Goto and Yasushige Yano",
year = "1998",
month = "11",
language = "English",
volume = "37",
pages = "6215--6216",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "11",

}

TY - JOUR

T1 - Production of highly charged Xe ions from the RIKEN 18 GHz electron cyclotron resonance ion source using a biased electrode

AU - Nakagawa, Takahide

AU - Biri, S.

AU - Kidera, Masanori

AU - Miyazawa, Yoshitoshi

AU - Hemmi, Masatake

AU - Chiba, Toshiya

AU - Inabe, Naohito

AU - Kase, Masayuki

AU - Kageyama, Tadashi

AU - Kamigaito, Osamu

AU - Goto, Akira

AU - Yano, Yasushige

PY - 1998/11

Y1 - 1998/11

N2 - We have observed the enhancement of Xe30,32+ ion beam intensity from the RIKEN 18 GHz electron cyclotron resonance ion source (ECRIS) using an electrode at bias voltage of ∼ -100 V. We have successfully obtained beam intensities of 11 eμA for the Xe30+ ion beam and 4 eμA for the Xe32+ ion beam using this method at an extraction voltage of 13 kV.

AB - We have observed the enhancement of Xe30,32+ ion beam intensity from the RIKEN 18 GHz electron cyclotron resonance ion source (ECRIS) using an electrode at bias voltage of ∼ -100 V. We have successfully obtained beam intensities of 11 eμA for the Xe30+ ion beam and 4 eμA for the Xe32+ ion beam using this method at an extraction voltage of 13 kV.

KW - Biased electrode

KW - Electron cyclotron resonance ion source (ECRIS)

KW - Extraction voltage

KW - Microwave power

KW - Xe ion

UR - http://www.scopus.com/inward/record.url?scp=0032206560&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032206560&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0032206560

VL - 37

SP - 6215

EP - 6216

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11

ER -