Processing of transparent materials using visible nanosecond laser pulses

B. Hopp, T. Smausz, M. Bereznai

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Laser micromachining of transparent materials is an intensively studied research area from the point of view of microoptical element fabrication. One of the most promising indirect processing methods is the laser-induced back-side dry etching (LIBDE). During this method, transparent targets are contacted with solid thin layers, which absorb and transform the pulse energy resulting in etching. The applicability of LIBDE technology for processing of fused silica using a visible nanosecond dye laser (λ=500 nm, FWHM=11 ns) and a 100-nm-thick aluminium absorbing layer was investigated. The applied fluence was varied in the range of 0-3050 mJ/cm2; the illuminated area was 0.1 mm2. The threshold fluence of the LIBDE etching of fused silica was found to be approximately 540 mJ/cm2. The chemical composition of the surface layers on and around the etched holes was investigated by field-emission scanning electron microscopy and energy-dispersive X-ray spectrometry. It was found that on average 0.4±0.3 at.∈% aluminium is built into the upper ∼ 1-μm-thick volume of the illuminated fused silica, while the aluminium content fell below the detection limit in the case of the original surface. Our experiments proved that the LIBDE procedure is suitable for microprocessing of transparent materials using visible nanosecond laser light.

Original languageEnglish
Pages (from-to)77-79
Number of pages3
JournalApplied Physics A: Materials Science and Processing
Volume87
Issue number1
DOIs
Publication statusPublished - Apr 1 2007

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ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

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