Preparation of TiO2/WO3 composite photocatalysts by the adjustment of the semiconductors' surface charge

Lucian Baia, Eszter Orbán, Szilvia Fodor, Boglárka Hampel, Endre Zsolt Kedves, Kata Saszet, István Székely, Éva Karácsonyi, Balázs Réti, Péter Berki, Adriana Vulpoi, Klára Magyari, Alexandra Csavdári, Csaba Bolla, Veronica Coşoveanu, Klára Hernádi, Monica Baia, András Dombi, Virginia Danciu, Gábor KovácsZsolt Pap

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

The present research focused on the preparation of TiO2/WO3 (76/24 wt. %) composite photocatalysts for the photodegradation of methyl orange under UV light. The composites were prepared by the adjustment of the surface charge of the individual semiconductors, achieving a homogeneous distribution of the components within the composite. This resulted in a homogeneous distribution of the components within the composite. The individual WO3 and TiO2 nanocrystals were obtained either by sol-gel or by hydrothermal synthesis. The produced nanomaterials were characterized by using TEM, SEM, XRD and DRS. Major differences in their photocatalytic performance depended on the nature of the precursors and the synthesis pathway.

Original languageEnglish
Pages (from-to)66-71
Number of pages6
JournalMaterials Science in Semiconductor Processing
Volume42
DOIs
Publication statusPublished - Feb 1 2016

Keywords

  • Photocatalytic activity
  • Semiconductor composites
  • Surface charge
  • Titania
  • Tungsten oxide

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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    Baia, L., Orbán, E., Fodor, S., Hampel, B., Kedves, E. Z., Saszet, K., Székely, I., Karácsonyi, É., Réti, B., Berki, P., Vulpoi, A., Magyari, K., Csavdári, A., Bolla, C., Coşoveanu, V., Hernádi, K., Baia, M., Dombi, A., Danciu, V., ... Pap, Z. (2016). Preparation of TiO2/WO3 composite photocatalysts by the adjustment of the semiconductors' surface charge. Materials Science in Semiconductor Processing, 42, 66-71. https://doi.org/10.1016/j.mssp.2015.08.042