Porous silicon bulk micromachining for thermally isolated membrane formation

Csaba Dücsö, Éva Vázsonyi, Mária Ádám, Imre Szabó, I. István Bársony, Johannes G.E. Gardeniers, Albert Van Den Berg

Research output: Contribution to journalArticle

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A novel low thermal budget technique Is proposed for the preparation of thermally isolated silicon membranes. The selective formation of porous silicon in a p-type silicon wafer results in an undercut profile below the implanted n-type silicon regions. The sacrificial porous layer is subsequently removed in a dilute KOH solution. A non-stoichiometric LPCVD nitride layer combination forms the suspension of the single-crystalline silicon membranes. This technique eliminates the need for epitaxial substrates and backside alignment, and proves to be very efficient in the realization of a high-temperature micro-hotplate operating with minimum power consumption for the purpose of integrated gas sensors.

Original languageEnglish
Pages (from-to)235-239
Number of pages5
JournalSensors and Actuators, A: Physical
Issue number1-3
Publication statusPublished - May 1997



  • Bulk micromachining
  • Membranes
  • Porous silicon

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering

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