Plasmon excitations in electron emission processes. Comparison between XPS and AES

J. L. Gervasoni, L. Kövér

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The excitation of bulk and surface plasmons in the presence of a solid surface during the emission of electrons in X-ray photoemission spectroscopy (XPS) and in Auger electron spectroscopy (AES) is investigated. The modifications in the energy loss spectra as well as in the plasmon excitations due to the sudden creation of electron-hole pairs, electron transport phenomena and the presence of residual holes and furthermore the proximity of the surface are analysed. The results illustrate that, from a theoretical point of view, separation of extrinsic and intrinsic contributions could be ambiguous (in terms of independent processes) due to interference effects between the photoelectron and photohole present in both processes. A comparison of the results of our model with experimental spectra showed a good agreement.

Original languageEnglish
Pages (from-to)1049-1053
Number of pages5
JournalVacuum
Volume83
Issue number7
DOIs
Publication statusPublished - Mar 24 2009

Fingerprint

Electron emission
Auger electron spectroscopy
Photoelectron spectroscopy
X ray spectroscopy
electron emission
Auger spectroscopy
electron spectroscopy
photoelectric emission
plasmons
solid surfaces
spectroscopy
excitation
proximity
photoelectrons
Plasmons
electrons
x rays
Electrons
energy dissipation
Photoelectrons

Keywords

  • AES
  • Electron emission
  • Extrinsic excitations
  • Intrinsic excitations
  • Plasmon excitations
  • XPS

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Instrumentation
  • Surfaces, Coatings and Films

Cite this

Plasmon excitations in electron emission processes. Comparison between XPS and AES. / Gervasoni, J. L.; Kövér, L.

In: Vacuum, Vol. 83, No. 7, 24.03.2009, p. 1049-1053.

Research output: Contribution to journalArticle

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