Plasma mirror effect with a short-pulse KrF laser

I. B. Földes, A. Barna, D. Csáti, L. Szúcs, S. Szatmári

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Plasma mirror effect is demonstrated for short-pulse KrF lasers. It is shown that the reflectivity of the plasma starts to increase at the plasma threshold of 1012W/cm2 and it saturates at 10 14W/cm2. The maximum reflectivity was ∼33% for 45° angle of incidence, and ∼50% was reached for 12.4°. This strong reflection allows even its direct application for short-pulse 248 nm systems whereas using it before the last amplifier may even clean the pulse from spatial inhomogeneities.

Original languageEnglish
Article number032004
JournalJournal of Physics: Conference Series
Volume244
Issue numberPART 3
DOIs
Publication statusPublished - 2010

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mirrors
pulses
lasers
reflectance
inhomogeneity
amplifiers
incidence
thresholds

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Plasma mirror effect with a short-pulse KrF laser. / Földes, I. B.; Barna, A.; Csáti, D.; Szúcs, L.; Szatmári, S.

In: Journal of Physics: Conference Series, Vol. 244, No. PART 3, 032004, 2010.

Research output: Contribution to journalArticle

Földes, I. B. ; Barna, A. ; Csáti, D. ; Szúcs, L. ; Szatmári, S. / Plasma mirror effect with a short-pulse KrF laser. In: Journal of Physics: Conference Series. 2010 ; Vol. 244, No. PART 3.
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