PHASE SEPARATION IN INTERACTIONS OF TANTALUM-CHROMIUM ALLOY ON Si.

C. J. Palmstrom, J. Gyulai, J. W. Mayer

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Bilayers and codeposited alloys of Cr and Ta on Si were studied using Rutherford backscattering and glancing angle x-ray diffraction as a function of thermal annealing up to 800 degree C. The bilayers produce layered structures of TaSi//2 and CrSi//2. Phase separation was observed for the alloy Cr//xTa//1// minus //x layers on Si. The interaction produced CrSi//2 next to the Si and an outer layer containing a mixture of CrSi//2 and TaSi//2. No ternary phase formation was detected for anneals up to 800 degree C.

Original languageEnglish
Pages (from-to)452-454
Number of pages3
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume1
Issue number2 pt 1
DOIs
Publication statusPublished - Apr 1982

Fingerprint

tantalum alloys
Tantalum alloys
Chromium Alloys
chromium alloys
Chromium alloys
Phase separation
Rutherford backscattering spectroscopy
backscattering
x ray diffraction
Diffraction
interactions
Annealing
X rays
annealing

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

PHASE SEPARATION IN INTERACTIONS OF TANTALUM-CHROMIUM ALLOY ON Si. / Palmstrom, C. J.; Gyulai, J.; Mayer, J. W.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 1, No. 2 pt 1, 04.1982, p. 452-454.

Research output: Contribution to journalArticle

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