Phase grating fabrication in glass via ion implantation

Research output: Contribution to journalConference article

Abstract

Transmission phase gratings have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks. Both mono- and multienergy implantations have been applied. Diffraction efficiencies of the gratings as function of the energy and dose of the ion implantation were measured. The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast-microscopy and scanning electron microscopy. Diffraction efficiencies up to 20% have been obtained.

Original languageEnglish
Pages (from-to)171-182
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4944
DOIs
Publication statusPublished - Dec 1 2002
EventIntegrated Optical Devices: Fabrication and Testing - Brugge, Belgium
Duration: Oct 30 2002Nov 1 2002

Keywords

  • Diffraction grating
  • Interference microscopy
  • Ion implantation
  • Phase-contrast microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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