Passivation of TiAl intermetallics by the mixed oxide Al2TiO5

K. Kovács, K. Josepovits, G. Kiss, H. Zillgen, P. Deák

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Recently, a two phase TiAl/Ti3Al bulk microcrystalline system between room temperature (RT) and 1000°C applying in situ XPS analysis on its low-pressure oxidation characteristics was reported. The key finding was that at high temperature a new ternary oxide phase-Al2TiO5-appears changing the composition of the surface substantially. This paper shows that the formation of Al2TiO5 increases the oxidation resistance.

Original languageEnglish
JournalPhysica Status Solidi (A) Applied Research
Volume193
Issue number1
DOIs
Publication statusPublished - Sep 2002

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oxidation resistance
mixed oxides
Passivation
Oxides
passivity
Intermetallics
intermetallics
low pressure
oxidation
oxides
Oxidation resistance
room temperature
X ray photoelectron spectroscopy
Oxidation
Temperature
Chemical analysis

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Passivation of TiAl intermetallics by the mixed oxide Al2TiO5. / Kovács, K.; Josepovits, K.; Kiss, G.; Zillgen, H.; Deák, P.

In: Physica Status Solidi (A) Applied Research, Vol. 193, No. 1, 09.2002.

Research output: Contribution to journalArticle

Kovács, K. ; Josepovits, K. ; Kiss, G. ; Zillgen, H. ; Deák, P. / Passivation of TiAl intermetallics by the mixed oxide Al2TiO5. In: Physica Status Solidi (A) Applied Research. 2002 ; Vol. 193, No. 1.
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