Oscillations and huge preferences of PbTe crystal surface sputtering under Secondary Neutral Mass Spectrometry conditions

D. M. Zayachuk, E. I. Slynko, V. E. Slynko, A. Csík

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Sputtering of PbTe crystals by Ar+ plasma with ion energies 50-550 eV is investigated. A dependence of sputter yields of the Te and Pb on the sputtering ion energy and sputtering time is measured. New phenomena: aperiodical oscillations of Pb and Te sputtering; a huge preference of Te sputtering reaching more than two orders of magnitude at the beginning of sputtering process; and a significant excess of Te integrated sputter yield over that of Pb for prolonged sputtering by low energy plasma at 50-160 eV, are observed. It is substantiated that these phenomena can be caused by the peculiarities of the charge states of the interstitial Pb and Te in PbTe crystal matrix and the processes of re-deposition of sputtered atoms on the sputtered surface.

Original languageEnglish
Pages (from-to)167-169
Number of pages3
JournalMaterials Letters
Volume173
DOIs
Publication statusPublished - Jun 15 2016

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crystal surfaces
Mass spectrometry
Sputtering
mass spectroscopy
sputtering
oscillations
Crystals
Ions
Plasmas
crystals
energy
interstitials
ions
Atoms
matrices
atoms

Keywords

  • PbTe
  • Preferential sputtering
  • SNMS
  • Sputter yield
  • Sputtering process

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Oscillations and huge preferences of PbTe crystal surface sputtering under Secondary Neutral Mass Spectrometry conditions. / Zayachuk, D. M.; Slynko, E. I.; Slynko, V. E.; Csík, A.

In: Materials Letters, Vol. 173, 15.06.2016, p. 167-169.

Research output: Contribution to journalArticle

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AU - Csík, A.

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AB - Sputtering of PbTe crystals by Ar+ plasma with ion energies 50-550 eV is investigated. A dependence of sputter yields of the Te and Pb on the sputtering ion energy and sputtering time is measured. New phenomena: aperiodical oscillations of Pb and Te sputtering; a huge preference of Te sputtering reaching more than two orders of magnitude at the beginning of sputtering process; and a significant excess of Te integrated sputter yield over that of Pb for prolonged sputtering by low energy plasma at 50-160 eV, are observed. It is substantiated that these phenomena can be caused by the peculiarities of the charge states of the interstitial Pb and Te in PbTe crystal matrix and the processes of re-deposition of sputtered atoms on the sputtered surface.

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