OPTIMIZATION OF TECHNOLOGY FOR THE SYSTEMS OF HARD-OXIDE LAYERS BY SPECTROSCOPIC METHODS.

K. Fluck, G. Szalai, J. Kojnok, A. Szász

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The well-known evaporating process of hard-oxide coatings for laser mirrors has many uncontrolled parameters. This paper deals with the TiO//2-SiO//2 hard-oxides systems. The optimization of technology is based on optical (transmission, reflection parameters etc), spectroscopical left bracket soft x-ray emission spectroscopy /SXES/, x-ray fluorescence spectroscopy /XFS/ right bracket , structural (x-ray diffraction /XRD/) and damage threshold /DT/ examinations. The TiO//2 was found in the evaporated layers in two equilibrium phases - rutile and anatase - depending on the evaporation conditions.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsJ.Roland Jacobsson
PublisherSPIE
Pages307-313
Number of pages7
Volume652
ISBN (Print)0892526874
Publication statusPublished - 1986

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brackets
X rays
x ray fluorescence
optimization
Oxides
oxides
yield point
Laser mirrors
anatase
rutile
spectroscopy
x ray diffraction
examination
Fluorescence spectroscopy
Emission spectroscopy
evaporation
mirrors
Light transmission
coatings
Phase equilibria

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Fluck, K., Szalai, G., Kojnok, J., & Szász, A. (1986). OPTIMIZATION OF TECHNOLOGY FOR THE SYSTEMS OF HARD-OXIDE LAYERS BY SPECTROSCOPIC METHODS. In J. R. Jacobsson (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 652, pp. 307-313). SPIE.

OPTIMIZATION OF TECHNOLOGY FOR THE SYSTEMS OF HARD-OXIDE LAYERS BY SPECTROSCOPIC METHODS. / Fluck, K.; Szalai, G.; Kojnok, J.; Szász, A.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / J.Roland Jacobsson. Vol. 652 SPIE, 1986. p. 307-313.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Fluck, K, Szalai, G, Kojnok, J & Szász, A 1986, OPTIMIZATION OF TECHNOLOGY FOR THE SYSTEMS OF HARD-OXIDE LAYERS BY SPECTROSCOPIC METHODS. in JR Jacobsson (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 652, SPIE, pp. 307-313.
Fluck K, Szalai G, Kojnok J, Szász A. OPTIMIZATION OF TECHNOLOGY FOR THE SYSTEMS OF HARD-OXIDE LAYERS BY SPECTROSCOPIC METHODS. In Jacobsson JR, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 652. SPIE. 1986. p. 307-313
Fluck, K. ; Szalai, G. ; Kojnok, J. ; Szász, A. / OPTIMIZATION OF TECHNOLOGY FOR THE SYSTEMS OF HARD-OXIDE LAYERS BY SPECTROSCOPIC METHODS. Proceedings of SPIE - The International Society for Optical Engineering. editor / J.Roland Jacobsson. Vol. 652 SPIE, 1986. pp. 307-313
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