Optical damage testing of materials for use in 157 nm photo-lithographic systems

Richard Morton, Todd Embree, Z. Bor, Chris Van Peski

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

As photolithographic processes utilize ever shorter wavelengths to produce more densely packed circuitry on silicon chips, the choice of materials suitable for use in the DUV spectral region becomes severely limited. We report here on preliminary life test results for calcium fluoride irradiated at 157 nm by F2 laser beams. The sample housing and beam delivery tubes were purged continuously with high purity nitrogen to keep the background oxygen level as low as possible and to sweep away any potential organic gases liberated from the sample mounting hardware and overall experimental apparatus. Data were collected to evaluate induced changes in transmission, wavefront distortion and birefringence over the course of billions of shots at a nominal fluence of 0.1 mJ / cm2.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsC.J. Progler
Pages1145-1157
Number of pages13
Volume4346
Edition2
DOIs
Publication statusPublished - 2001
EventOptical Microlithograpy XIV - Santa Clara, CA, United States
Duration: Feb 27 2001Mar 2 2001

Other

OtherOptical Microlithograpy XIV
CountryUnited States
CitySanta Clara, CA
Period2/27/013/2/01

Fingerprint

Calcium fluoride
Wave transmission
Wavefronts
Birefringence
Mountings
Laser beams
damage
Nitrogen
Hardware
calcium fluorides
Silicon
Wavelength
Oxygen
Testing
mounting
Gases
shot
birefringence
delivery
fluence

Keywords

  • 157 nm
  • Calcium fluoride
  • DUV
  • Materials
  • Photolithography

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Morton, R., Embree, T., Bor, Z., & Van Peski, C. (2001). Optical damage testing of materials for use in 157 nm photo-lithographic systems. In C. J. Progler (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (2 ed., Vol. 4346, pp. 1145-1157) https://doi.org/10.1117/12.435648

Optical damage testing of materials for use in 157 nm photo-lithographic systems. / Morton, Richard; Embree, Todd; Bor, Z.; Van Peski, Chris.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / C.J. Progler. Vol. 4346 2. ed. 2001. p. 1145-1157.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Morton, R, Embree, T, Bor, Z & Van Peski, C 2001, Optical damage testing of materials for use in 157 nm photo-lithographic systems. in CJ Progler (ed.), Proceedings of SPIE - The International Society for Optical Engineering. 2 edn, vol. 4346, pp. 1145-1157, Optical Microlithograpy XIV, Santa Clara, CA, United States, 2/27/01. https://doi.org/10.1117/12.435648
Morton R, Embree T, Bor Z, Van Peski C. Optical damage testing of materials for use in 157 nm photo-lithographic systems. In Progler CJ, editor, Proceedings of SPIE - The International Society for Optical Engineering. 2 ed. Vol. 4346. 2001. p. 1145-1157 https://doi.org/10.1117/12.435648
Morton, Richard ; Embree, Todd ; Bor, Z. ; Van Peski, Chris. / Optical damage testing of materials for use in 157 nm photo-lithographic systems. Proceedings of SPIE - The International Society for Optical Engineering. editor / C.J. Progler. Vol. 4346 2. ed. 2001. pp. 1145-1157
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