Optical damage testing of materials for use in 157 nm photo-lithographic systems

Richard Morton, Todd Embree, Zsolt Bor, Chris Van Peski

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

As photolithographic processes utilize ever shorter wavelengths to produce more densely packed circuitry on silicon chips, the choice of materials suitable for use in the DUV spectral region becomes severely limited. We report here on preliminary life test results for calcium fluoride irradiated at 157 nm by F2 laser beams. The sample housing and beam delivery tubes were purged continuously with high purity nitrogen to keep the background oxygen level as low as possible and to sweep away any potential organic gases liberated from the sample mounting hardware and overall experimental apparatus. Data were collected to evaluate induced changes in transmission, wavefront distortion and birefringence over the course of billions of shots at a nominal fluence of 0.1 mJ / cm2.

Original languageEnglish
Pages (from-to)1145-1157
Number of pages13
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4346
Issue number2
DOIs
Publication statusPublished - Dec 1 2001
EventOptical Microlithograpy XIV - Santa Clara, CA, United States
Duration: Feb 27 2001Mar 2 2001

Keywords

  • 157 nm
  • Calcium fluoride
  • DUV
  • Materials
  • Photolithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Optical damage testing of materials for use in 157 nm photo-lithographic systems'. Together they form a unique fingerprint.

  • Cite this