Optical, compositional and structural properties of pulsed laser deposited nitrogen-doped Titanium-dioxide

B. Farkas, P. Heszler, J. Budai, A. Oszkó, M. Ottosson, Zs Geretovszky

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4 Citations (Scopus)


N-doped TiO 2 thin films were prepared using pulsed laser deposition by ablating metallic Ti target with pulses of 248 nm wavelength, at 330 °C substrate temperature in reactive atmospheres of N 2 /O 2 gas mixtures. These films were characterized by spectroscopic ellipsometry, X-ray photoelectron spectroscopy and X-ray diffraction. Optical properties are presented as a function of the N 2 content in the processing gas mixture and correlated to nitrogen incorporation into the deposited layers. The optical band gap values decreased with increasing N concentration in the films, while a monotonically increasing tendency and a maximum can be observed in case of extinction coefficient and refractive index, respectively. It is also shown that the amount of substitutional N can be increased up to 7.7 at.%, but the higher dopant concentration inhibits the crystallization of the samples.

Original languageEnglish
Pages (from-to)149-154
Number of pages6
JournalApplied Surface Science
Publication statusPublished - Mar 1 2018



  • Chemical composition
  • Ellipsometry
  • PLD
  • Photocatalytic material
  • Structural property
  • TiO N

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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