On the interpretation of micro-PIXE measurements on a prototype microstructured reference material

Uwe Wätjen, I. Bársony, Geoff W. Grime, I. Rajta

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

In order to determine the beam spot size and scanning properties of ion microbeam systems, a novel reference material has been developed, consisting of permalloy (81% Ni, 19% Fe) strip patterns on silicon substrate. Due to the choice of substrate and pattern materials, these samples exhibit a high elemental contrast suitable for analysis with X-ray detection and ion scattering techniques. The microlithographic production scheme is briefly described. A prototype chip of this material was investigated with PIXE and RBS analysis in a scanning nuclear microprobe. It proved to be extremely useful in the routine to focus the ion microbeam and to determine its spot size. Due to the microscopic structure of these samples, a geometric dependence of matrix effects in the production of Si X-rays from the substrate material could be shown. Even dead-time effects in the counting electronics, showing up as an apparent thickness gradient, could be observed. Besides its primary role in microbeam diagnostics, this reference material can serve an educational role in developing the analyst's ability to correctly identify and interpret such artefacts.

Original languageEnglish
Pages (from-to)532-537
Number of pages6
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume150
Issue number1-4
DOIs
Publication statusPublished - Apr 2 1999

Fingerprint

microbeams
prototypes
Ions
scanning
Permalloys (trademark)
ion scattering
Substrates
artifacts
strip
counting
ions
Scanning
x rays
X rays
chips
Silicon
gradients
silicon
matrices
scattering

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

@article{614636abb76644a3843bec7835259a2c,
title = "On the interpretation of micro-PIXE measurements on a prototype microstructured reference material",
abstract = "In order to determine the beam spot size and scanning properties of ion microbeam systems, a novel reference material has been developed, consisting of permalloy (81{\%} Ni, 19{\%} Fe) strip patterns on silicon substrate. Due to the choice of substrate and pattern materials, these samples exhibit a high elemental contrast suitable for analysis with X-ray detection and ion scattering techniques. The microlithographic production scheme is briefly described. A prototype chip of this material was investigated with PIXE and RBS analysis in a scanning nuclear microprobe. It proved to be extremely useful in the routine to focus the ion microbeam and to determine its spot size. Due to the microscopic structure of these samples, a geometric dependence of matrix effects in the production of Si X-rays from the substrate material could be shown. Even dead-time effects in the counting electronics, showing up as an apparent thickness gradient, could be observed. Besides its primary role in microbeam diagnostics, this reference material can serve an educational role in developing the analyst's ability to correctly identify and interpret such artefacts.",
author = "Uwe W{\"a}tjen and I. B{\'a}rsony and Grime, {Geoff W.} and I. Rajta",
year = "1999",
month = "4",
day = "2",
doi = "10.1016/S0168-583X(98)01073-8",
language = "English",
volume = "150",
pages = "532--537",
journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",
issn = "0168-583X",
publisher = "Elsevier",
number = "1-4",

}

TY - JOUR

T1 - On the interpretation of micro-PIXE measurements on a prototype microstructured reference material

AU - Wätjen, Uwe

AU - Bársony, I.

AU - Grime, Geoff W.

AU - Rajta, I.

PY - 1999/4/2

Y1 - 1999/4/2

N2 - In order to determine the beam spot size and scanning properties of ion microbeam systems, a novel reference material has been developed, consisting of permalloy (81% Ni, 19% Fe) strip patterns on silicon substrate. Due to the choice of substrate and pattern materials, these samples exhibit a high elemental contrast suitable for analysis with X-ray detection and ion scattering techniques. The microlithographic production scheme is briefly described. A prototype chip of this material was investigated with PIXE and RBS analysis in a scanning nuclear microprobe. It proved to be extremely useful in the routine to focus the ion microbeam and to determine its spot size. Due to the microscopic structure of these samples, a geometric dependence of matrix effects in the production of Si X-rays from the substrate material could be shown. Even dead-time effects in the counting electronics, showing up as an apparent thickness gradient, could be observed. Besides its primary role in microbeam diagnostics, this reference material can serve an educational role in developing the analyst's ability to correctly identify and interpret such artefacts.

AB - In order to determine the beam spot size and scanning properties of ion microbeam systems, a novel reference material has been developed, consisting of permalloy (81% Ni, 19% Fe) strip patterns on silicon substrate. Due to the choice of substrate and pattern materials, these samples exhibit a high elemental contrast suitable for analysis with X-ray detection and ion scattering techniques. The microlithographic production scheme is briefly described. A prototype chip of this material was investigated with PIXE and RBS analysis in a scanning nuclear microprobe. It proved to be extremely useful in the routine to focus the ion microbeam and to determine its spot size. Due to the microscopic structure of these samples, a geometric dependence of matrix effects in the production of Si X-rays from the substrate material could be shown. Even dead-time effects in the counting electronics, showing up as an apparent thickness gradient, could be observed. Besides its primary role in microbeam diagnostics, this reference material can serve an educational role in developing the analyst's ability to correctly identify and interpret such artefacts.

UR - http://www.scopus.com/inward/record.url?scp=0343164315&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0343164315&partnerID=8YFLogxK

U2 - 10.1016/S0168-583X(98)01073-8

DO - 10.1016/S0168-583X(98)01073-8

M3 - Article

AN - SCOPUS:0343164315

VL - 150

SP - 532

EP - 537

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

SN - 0168-583X

IS - 1-4

ER -