On the growth mechanism of pulsed laser deposited carbon nitride films

T. Szörényi, E. Fogarassy

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Carbon nitride films have been deposited by ArF excimer laser ablation of a graphite target in the 10-2 to 100Pa N2 pressure range. Arrival rates of the constituting elements, mass densities and apparent growth rates have been derived from areal densities of both carbon and nitrogen atoms, determined by ion beam techniques, and film thicknesses, measured by a mechanical stylus. Below 5Pa the film building blocks are atoms and molecules while above ∼50Pa the formation and interaction of clusters and particles determine the film growth. The results reveal that the formation, composition and microstructure of carbon nitride films fabricated in this process window is governed by gas-phase processes.

Original languageEnglish
Pages (from-to)502-506
Number of pages5
JournalApplied Surface Science
Volume208-209
Issue number1
DOIs
Publication statusPublished - Mar 15 2003

Fingerprint

carbon nitrides
Carbon nitride
Pulsed lasers
pulsed lasers
Atoms
Graphite
Excimer lasers
Film growth
Laser ablation
Ion beams
Film thickness
Nitrogen
Carbon
Gases
excimer lasers
nitrogen atoms
laser ablation
arrivals
atoms
Microstructure

Keywords

  • Carbon nitride
  • Microstructure
  • PLD
  • Thin films

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

On the growth mechanism of pulsed laser deposited carbon nitride films. / Szörényi, T.; Fogarassy, E.

In: Applied Surface Science, Vol. 208-209, No. 1, 15.03.2003, p. 502-506.

Research output: Contribution to journalArticle

@article{90754e01893b4352a72f4cb73bdabb79,
title = "On the growth mechanism of pulsed laser deposited carbon nitride films",
abstract = "Carbon nitride films have been deposited by ArF excimer laser ablation of a graphite target in the 10-2 to 100Pa N2 pressure range. Arrival rates of the constituting elements, mass densities and apparent growth rates have been derived from areal densities of both carbon and nitrogen atoms, determined by ion beam techniques, and film thicknesses, measured by a mechanical stylus. Below 5Pa the film building blocks are atoms and molecules while above ∼50Pa the formation and interaction of clusters and particles determine the film growth. The results reveal that the formation, composition and microstructure of carbon nitride films fabricated in this process window is governed by gas-phase processes.",
keywords = "Carbon nitride, Microstructure, PLD, Thin films",
author = "T. Sz{\"o}r{\'e}nyi and E. Fogarassy",
year = "2003",
month = "3",
day = "15",
doi = "10.1016/S0169-4332(02)01445-9",
language = "English",
volume = "208-209",
pages = "502--506",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "1",

}

TY - JOUR

T1 - On the growth mechanism of pulsed laser deposited carbon nitride films

AU - Szörényi, T.

AU - Fogarassy, E.

PY - 2003/3/15

Y1 - 2003/3/15

N2 - Carbon nitride films have been deposited by ArF excimer laser ablation of a graphite target in the 10-2 to 100Pa N2 pressure range. Arrival rates of the constituting elements, mass densities and apparent growth rates have been derived from areal densities of both carbon and nitrogen atoms, determined by ion beam techniques, and film thicknesses, measured by a mechanical stylus. Below 5Pa the film building blocks are atoms and molecules while above ∼50Pa the formation and interaction of clusters and particles determine the film growth. The results reveal that the formation, composition and microstructure of carbon nitride films fabricated in this process window is governed by gas-phase processes.

AB - Carbon nitride films have been deposited by ArF excimer laser ablation of a graphite target in the 10-2 to 100Pa N2 pressure range. Arrival rates of the constituting elements, mass densities and apparent growth rates have been derived from areal densities of both carbon and nitrogen atoms, determined by ion beam techniques, and film thicknesses, measured by a mechanical stylus. Below 5Pa the film building blocks are atoms and molecules while above ∼50Pa the formation and interaction of clusters and particles determine the film growth. The results reveal that the formation, composition and microstructure of carbon nitride films fabricated in this process window is governed by gas-phase processes.

KW - Carbon nitride

KW - Microstructure

KW - PLD

KW - Thin films

UR - http://www.scopus.com/inward/record.url?scp=0037443245&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037443245&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(02)01445-9

DO - 10.1016/S0169-4332(02)01445-9

M3 - Article

VL - 208-209

SP - 502

EP - 506

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 1

ER -