Numerical calculation of pulsed laser deposited film profiles

Z. Kántor, T. Szvrinyi

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2 Citations (Scopus)


Pulsed laser deposition (PLD) is a straightforward method for production of the widest variety of materials, especially multicomponent oxides, in the form of thin film. One of the particular advantages of this technique, the possibility of control of film composition, is ensured by applying (reactive) atmospheres of pressures up to tenths of millibars. The extension dynamics of the laser generated plasma plume is simulated based on a microscopic collision model using Monte-Carlo calculations. The calculated spatial distribution of the film material as a function of pressure is compared to measured thickness profiles of bismuth films deposited in argon atmosphere. The numerical calculation is successfully applied for the interpretation of the main features obtained in the 10-6-10-1 mbar pressure range, i.e. the decrease in deposition rate and the broadening of the film thickness profiles with increasing pressure.

Original languageEnglish
Pages (from-to)421-424
Number of pages4
Issue number3-4
Publication statusPublished - Jul 1 1998


ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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