New phase-shifting technique for deep UV excimer laser-based lithography

Zsolt Bor, Joseph R. Cavallaro, Miklos Erdelyi, Motoi Kido, Chaitali Sengupta, Michael C. Smayling, Gabor Szabo, Frank K. Tittel, William L. Wilson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper reports simulation and experimental details of a novel phase shifting technique based on laser interferometry. Phase shifting is one of the most promising techniques for the fabrication of high density DRAM's. In recent years many kinds of phase shifting methods have been proposed to extend the resolution limit and contrast of image patterns. These techniques however, have several problems that result from the phase shift elements on the mask, especially when applied to W excimer laser illumination. A new technique will be described that is based on a one-layered reticle which is used as both a reflective and transmissive mask, irradiated from both the front and the back sides. A combination of both off-axis illumination, as well as phase shift are used in the new method. Both the relative path length of the two beams as well as their amplitude can be manipulated in such a way that near 100% contrast can be achieved in the final image. Experimental as well as simulation data are used to demonstrate this new method.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages195-202
Number of pages8
ISBN (Print)0819417270
Publication statusPublished - Jan 1 1995
EventUV and Visible Lasers and Laser Crystal Growth - San Jose, CA, USA
Duration: Feb 7 1995Feb 9 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2380
ISSN (Print)0277-786X

Other

OtherUV and Visible Lasers and Laser Crystal Growth
CitySan Jose, CA, USA
Period2/7/952/9/95

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Bor, Z., Cavallaro, J. R., Erdelyi, M., Kido, M., Sengupta, C., Smayling, M. C., Szabo, G., Tittel, F. K., & Wilson, W. L. (1995). New phase-shifting technique for deep UV excimer laser-based lithography. In Proceedings of SPIE - The International Society for Optical Engineering (pp. 195-202). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2380). Society of Photo-Optical Instrumentation Engineers.