New interferometric phase-shifting technique for sub-half-micron laser microlithography

Miklos Erdelyi, Chaitali Sengupta, Zsolt Bor, Joseph R. Cavallaro, Motoi Kido, Michael C. Smayling, Frank K. Tittel, William L. Wilson, Gabor Szabo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This paper reports recent progress in achieving subhalf-micron feature sizes with UV laser illumination based on a novel interferometric phase shifting (IPS) technique. In the IPS arrangement, the intensity and amount of phase shift of the shifted beam can be controlled continuously and independently using the same mask. Consequently the method can be considered as a convenient general testbed for practical phase shifting concepts such as strong, weak and attenuated phase shifting. Recent measurements of the lithographic performance of a new concept are reported where phase shifting is combined with off-axis illumination. Experimental as well as simulation data are used to demonstrate this new method. A lithography simulator, Depict from Technology Modeling Associates, Inc. and a related Integrated CAD Framework which is being developed at Rice University was used to simulate and evaluate the performance of the IPS scheme.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages827-837
Number of pages11
ISBN (Print)0819417882
Publication statusPublished - Jan 1 1995
EventOptical/Laser Microlithography VIII - Santa Clara, CA, USA
Duration: Feb 22 1995Feb 24 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2440
ISSN (Print)0277-786X

Other

OtherOptical/Laser Microlithography VIII
CitySanta Clara, CA, USA
Period2/22/952/24/95

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Erdelyi, M., Sengupta, C., Bor, Z., Cavallaro, J. R., Kido, M., Smayling, M. C., Tittel, F. K., Wilson, W. L., & Szabo, G. (1995). New interferometric phase-shifting technique for sub-half-micron laser microlithography. In Proceedings of SPIE - The International Society for Optical Engineering (pp. 827-837). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2440). Society of Photo-Optical Instrumentation Engineers.