Nearly aberration-free multiphoton polymerization into thick photoresist layers

Bence Horváth, P. Ormos, L. Kelemen

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam.

Original languageEnglish
Article number219
JournalMicromachines
Volume8
Issue number7
DOIs
Publication statusPublished - Jul 13 2017

Fingerprint

Photoresists
Aberrations
Polymerization
Substrates
Photons
Microchannels
Microfluidics
Elongation
Refractive index
Glass
Oils

Keywords

  • Hybrid manufacturing
  • Laser materials processing
  • Spatial light modulator
  • Spherical aberration
  • Two-photon polymerization

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Nearly aberration-free multiphoton polymerization into thick photoresist layers. / Horváth, Bence; Ormos, P.; Kelemen, L.

In: Micromachines, Vol. 8, No. 7, 219, 13.07.2017.

Research output: Contribution to journalArticle

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