Nanoscale lithography of graphene with crystallographic orientation control

G. Dobrik, P. Nemes-Incze, L. Tapasztó, Ph Lambin, L. Bíró

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The two scanning probe microscope based methods for the production of graphene nanoarchitectures with crystallographically oriented edges: scanning tunneling lithography (STL) and carbothermal etching (CTE) are compared. STL offers higher freedom in choosing the orientation, it makes possible sophisticated manipulation of the etched nanoarchitectures and immediate atomic resolution of the etched structure, but it suffers from the need of a conductive substrate. CTE at present can produce only zigzag edges, but these edges by the very nature of the process producing them are more regular than the edges produced by STL. CTE has the clear advantage that the produced nanoarchitectures are on an insulating substrate, no further transfer steps are needed. To date STL can produce graphene nanoribbons (GNRs) of a few nanometers in width, while the width of the GNRs produced by CTE is in the range of 20 nm.

Original languageEnglish
Pages (from-to)971-975
Number of pages5
JournalPhysica E: Low-Dimensional Systems and Nanostructures
Volume44
Issue number6
DOIs
Publication statusPublished - Mar 2012

Fingerprint

Graphite
Graphene
Lithography
graphene
lithography
Etching
Scanning
scanning
etching
Nanoribbons
Carbon Nanotubes
Substrates
manipulators
Microscopes
microscopes
probes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

Cite this

Nanoscale lithography of graphene with crystallographic orientation control. / Dobrik, G.; Nemes-Incze, P.; Tapasztó, L.; Lambin, Ph; Bíró, L.

In: Physica E: Low-Dimensional Systems and Nanostructures, Vol. 44, No. 6, 03.2012, p. 971-975.

Research output: Contribution to journalArticle

@article{bae4b29eac1c471bad4756ca86b8a674,
title = "Nanoscale lithography of graphene with crystallographic orientation control",
abstract = "The two scanning probe microscope based methods for the production of graphene nanoarchitectures with crystallographically oriented edges: scanning tunneling lithography (STL) and carbothermal etching (CTE) are compared. STL offers higher freedom in choosing the orientation, it makes possible sophisticated manipulation of the etched nanoarchitectures and immediate atomic resolution of the etched structure, but it suffers from the need of a conductive substrate. CTE at present can produce only zigzag edges, but these edges by the very nature of the process producing them are more regular than the edges produced by STL. CTE has the clear advantage that the produced nanoarchitectures are on an insulating substrate, no further transfer steps are needed. To date STL can produce graphene nanoribbons (GNRs) of a few nanometers in width, while the width of the GNRs produced by CTE is in the range of 20 nm.",
author = "G. Dobrik and P. Nemes-Incze and L. Tapaszt{\'o} and Ph Lambin and L. B{\'i}r{\'o}",
year = "2012",
month = "3",
doi = "10.1016/j.physe.2010.11.030",
language = "English",
volume = "44",
pages = "971--975",
journal = "Physica E: Low-Dimensional Systems and Nanostructures",
issn = "1386-9477",
publisher = "Elsevier",
number = "6",

}

TY - JOUR

T1 - Nanoscale lithography of graphene with crystallographic orientation control

AU - Dobrik, G.

AU - Nemes-Incze, P.

AU - Tapasztó, L.

AU - Lambin, Ph

AU - Bíró, L.

PY - 2012/3

Y1 - 2012/3

N2 - The two scanning probe microscope based methods for the production of graphene nanoarchitectures with crystallographically oriented edges: scanning tunneling lithography (STL) and carbothermal etching (CTE) are compared. STL offers higher freedom in choosing the orientation, it makes possible sophisticated manipulation of the etched nanoarchitectures and immediate atomic resolution of the etched structure, but it suffers from the need of a conductive substrate. CTE at present can produce only zigzag edges, but these edges by the very nature of the process producing them are more regular than the edges produced by STL. CTE has the clear advantage that the produced nanoarchitectures are on an insulating substrate, no further transfer steps are needed. To date STL can produce graphene nanoribbons (GNRs) of a few nanometers in width, while the width of the GNRs produced by CTE is in the range of 20 nm.

AB - The two scanning probe microscope based methods for the production of graphene nanoarchitectures with crystallographically oriented edges: scanning tunneling lithography (STL) and carbothermal etching (CTE) are compared. STL offers higher freedom in choosing the orientation, it makes possible sophisticated manipulation of the etched nanoarchitectures and immediate atomic resolution of the etched structure, but it suffers from the need of a conductive substrate. CTE at present can produce only zigzag edges, but these edges by the very nature of the process producing them are more regular than the edges produced by STL. CTE has the clear advantage that the produced nanoarchitectures are on an insulating substrate, no further transfer steps are needed. To date STL can produce graphene nanoribbons (GNRs) of a few nanometers in width, while the width of the GNRs produced by CTE is in the range of 20 nm.

UR - http://www.scopus.com/inward/record.url?scp=84861186179&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84861186179&partnerID=8YFLogxK

U2 - 10.1016/j.physe.2010.11.030

DO - 10.1016/j.physe.2010.11.030

M3 - Article

AN - SCOPUS:84861186179

VL - 44

SP - 971

EP - 975

JO - Physica E: Low-Dimensional Systems and Nanostructures

JF - Physica E: Low-Dimensional Systems and Nanostructures

SN - 1386-9477

IS - 6

ER -