Nanoresolution interface studies in thin films by synchrotron x-ray diffraction and by using x-ray waveguide structure

Z. Erdélyi, C. Cserháti, A. Csík, L. Daróczi, G. Langer, Z. Balogh, M. Varga, D. Beke, I. Zizak, A. Erko

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

In the last years we performed several measurements with synchrotron radiation of several facilities to reveal interesting interface phenomena on the nanoscale. We used both x-ray diffraction[1,2] (XRD) and spectrometry techniques. In this paper, we briefly summarize the results obtained from diffraction measurements, which lead us to our recent grazing incidence x-ray fluorescence analysis (GIXRF) and extended x-ray absorption fine structure (EXAFS) experiments. We show how a combination of experimental methods of GIXRF analysis and EXAFS spectroscopy in fluorescence detection with x-ray standingwaves (XSW) techniquewas applied for the depth profiling of a-Si/Co/a-Si layerswith nanometer resolution to monitor the growth of CoSi intermetallic phase. The investigated layerswere placed into the waveguide structure formed by two Ta films to increase sensitivity and accuracy of themeasurements.

Original languageEnglish
Pages (from-to)338-342
Number of pages5
JournalX-Ray Spectrometry
Volume38
Issue number4
DOIs
Publication statusPublished - Jul 2009

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Synchrotrons
Waveguides
Diffraction
X rays
Thin films
Fluorescence
Depth profiling
Synchrotron radiation
Spectrometry
Intermetallics
Spectroscopy
Experiments

ASJC Scopus subject areas

  • Spectroscopy

Cite this

Nanoresolution interface studies in thin films by synchrotron x-ray diffraction and by using x-ray waveguide structure. / Erdélyi, Z.; Cserháti, C.; Csík, A.; Daróczi, L.; Langer, G.; Balogh, Z.; Varga, M.; Beke, D.; Zizak, I.; Erko, A.

In: X-Ray Spectrometry, Vol. 38, No. 4, 07.2009, p. 338-342.

Research output: Contribution to journalArticle

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AU - Daróczi, L.

AU - Langer, G.

AU - Balogh, Z.

AU - Varga, M.

AU - Beke, D.

AU - Zizak, I.

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