Morphology and composition of ArF excimer laser deposited carbon nitride films as determined by analytical TEM

O. Geszti, G. Radnóczi, I. Bertóti, T. Szörényi, F. Antoni, E. Fogarassy

Research output: Contribution to journalConference article

9 Citations (Scopus)

Abstract

Carbon nitride films deposited onto room temperature silicon substrates by ArF excimer laser ablation of a graphite target in nitrogen atmosphere have been investigated after floating off in transmission electron microscope (TEM). All films fabricated in the 1-100Pa N 2 pressure and 1-10 Jcm -2 fluence domain are amorphous. It is the nitrogen pressure that governs both the composition and the morphology of the films, the effect of the laser fluence being weaker. The morphologies range from dense films grown in 1-5 Pa N 2 , to structures composed of carbon nitride clusters and voids between them, obtained at and above 50 Pa N 2 . Ablation with pulses of high fluence (10 J cm -2 ) results in more compact films. The oxygen content determined by energy dispersive X-ray spectrometry well correlates with the compactness of the films, being significantly higher in those fabricated at higher pressures and composed of clusters.

Original languageEnglish
Pages (from-to)502-506
Number of pages5
JournalApplied Surface Science
Volume186
Issue number1-4
DOIs
Publication statusPublished - Jan 28 2002
EventProceedings of the European Materials Research Society 2001 Symposium - Strasbourg, France
Duration: Jun 5 2001Jun 5 2001

Keywords

  • Ablation
  • Carbon nitride
  • Microstructure
  • PLD
  • Thin films

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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