Morphological and electrical study of FIB deposited amorphous W nanowires

E. Horváth, P. L. Neumann, A. L. Tóth, Z. E. Horváth, L. P. Biró

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Morphological and electrical measurements were carried out on W nanowires deposited by focused ion beam (FIB) onto the micro-hotplate of a micropellistor device. The I-V characteristics showed that the deposited W alloy wires have ohmic behaviour. Temperature dependent resistance measurements were carried out in vacuum (in situ in the chamber of the FIB/FESEM) and ex situ in air and in streaming nitrogen in the temperature range of 112-412 °C, using the micro-hotplate for temperature control. The first heat-up in vacuum caused a slight decrease of resistance followed by an irreversible, abrupt drop down to 3% of the as-deposited value, this value was kept during cool-down. The ex situ heat-up in air and N2 atmosphere caused increasing resistance at temperatures over the range 300-350 °C, after a similar, slight decrease in the range of 200-300 °C, like in the case of vacuum ambient measurements.

Original languageEnglish
Pages (from-to)837-840
Number of pages4
JournalMicroelectronic Engineering
Issue number5-8
Publication statusPublished - May 1 2007



  • Resistance measurement
  • Temperature dependence
  • W deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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