Modeling material saturation effects in microholographic recording

Zs Nagy, P. Koppa, F. Ujhelyi, E. Dietz, S. Frohmann, S. Orlic

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Microholographic data storage system model is presented that includes non-linear and non-local behavior of the storage material for accurate simulation of the system and optimization of the writing process. For the description of the photopolymer material a diffusion based nonlocal material model is used. The diffusion equation is solved numerically and the modulation of the dielectric constant is calculated. Diffraction efficiency of simulated microholograms and measurements were compared, and they show good agreement.

Original languageEnglish
Pages (from-to)1732-1737
Number of pages6
JournalOptics Express
Volume15
Issue number4
DOIs
Publication statusPublished - Feb 19 2007

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recording
saturation
photopolymers
data storage
permittivity
modulation
optimization
diffraction
simulation

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Nagy, Z., Koppa, P., Ujhelyi, F., Dietz, E., Frohmann, S., & Orlic, S. (2007). Modeling material saturation effects in microholographic recording. Optics Express, 15(4), 1732-1737. https://doi.org/10.1364/OE.15.001732

Modeling material saturation effects in microholographic recording. / Nagy, Zs; Koppa, P.; Ujhelyi, F.; Dietz, E.; Frohmann, S.; Orlic, S.

In: Optics Express, Vol. 15, No. 4, 19.02.2007, p. 1732-1737.

Research output: Contribution to journalArticle

Nagy, Z, Koppa, P, Ujhelyi, F, Dietz, E, Frohmann, S & Orlic, S 2007, 'Modeling material saturation effects in microholographic recording', Optics Express, vol. 15, no. 4, pp. 1732-1737. https://doi.org/10.1364/OE.15.001732
Nagy, Zs ; Koppa, P. ; Ujhelyi, F. ; Dietz, E. ; Frohmann, S. ; Orlic, S. / Modeling material saturation effects in microholographic recording. In: Optics Express. 2007 ; Vol. 15, No. 4. pp. 1732-1737.
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