Microstructuring of transparent dielectric films by TWIN-LIBWE method for OWLS applications

Bálint Kiss, Ferenc Ujhelyi, Áron Sipos, Balázs Farkas, Péter Dombi, Károly Osvay, Csaba Vass

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We report on the fabrication of micro- and submicrometer period transmission gratings in SiO2, Al2O3, and Y2O3 thin films by two-beam interferometric laser-induced backside wet etching (TWIN-LIBWE). The optimal etching parameter domain has been established for each film with the help of profilometric and atomic force microscopic measurements. The modulation depth and the quality of the etched SiO2 film is found excellent over a relatively broad fluence (285-600 mJ/cm2) and pulse quantity (1-150) range. For Al2O3, and Y2O3 films it is significantly narrower (250-260 mJ/cm2 and 1-10 pulses). We have tested the created gratings as waveguide couplers, which prove the suitability of the studied method to produce transmission gratings onto dielectric films.

Original languageEnglish
Pages (from-to)271-275
Number of pages5
JournalJournal of Laser Micro Nanoengineering
Volume8
Issue number3
DOIs
Publication statusPublished - Dec 1 2013

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Keywords

  • Grating
  • TWIN-LIBWE
  • Thin film
  • Waveguide

ASJC Scopus subject areas

  • Instrumentation
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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