Microstructure and electrical transport properties of pulse-plated nanocrystalline nickel electrodeposits

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Abstract

The microstructure and the electrical transport properties (the electrical resistivity, its temperature coefficient and the thermoelectric power) were investigated for pulse-plated nanocrystalline nickel electrodeposits. Transmission and scanning electron microscopy were used to study the microstructure (grain size and lattice defects) and the surface morphology respectively. The samples were prepared from the same bath as used previously for d.c. plating and the deposition current density was constant, in most cases idep = 20 A dm-2. In a given series, the pulse length ton was kept constant at 0.001, 0.01, 0.1, 1 or 10 s and the separation between pulses toff was varied from 0.001 s to 10 s. Systematic variations of the electrical transport parameters with ton and toff were observed, which we attempt to explain in terms of the periodic variation due to pulse-plating of the local Ni2+ concentration at the cathode-electrolyte interface.

Original languageEnglish
Pages (from-to)57-65
Number of pages9
JournalSurface and Coatings Technology
Volume88
Issue number1-3
Publication statusPublished - Jan 1997

Fingerprint

Nickel
Plating
Transport properties
transport properties
nickel
microstructure
Microstructure
Crystal defects
Thermoelectric power
pulses
plating
Electrolytes
Surface morphology
Cathodes
Current density
Transmission electron microscopy
Scanning electron microscopy
periodic variations
baths
grain size

Keywords

  • Electrical transport
  • Nanocrystalline nickel
  • Pulse-plated nickel

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

@article{ffb9ff6a7d414d44bdb211894af0fa2b,
title = "Microstructure and electrical transport properties of pulse-plated nanocrystalline nickel electrodeposits",
abstract = "The microstructure and the electrical transport properties (the electrical resistivity, its temperature coefficient and the thermoelectric power) were investigated for pulse-plated nanocrystalline nickel electrodeposits. Transmission and scanning electron microscopy were used to study the microstructure (grain size and lattice defects) and the surface morphology respectively. The samples were prepared from the same bath as used previously for d.c. plating and the deposition current density was constant, in most cases idep = 20 A dm-2. In a given series, the pulse length ton was kept constant at 0.001, 0.01, 0.1, 1 or 10 s and the separation between pulses toff was varied from 0.001 s to 10 s. Systematic variations of the electrical transport parameters with ton and toff were observed, which we attempt to explain in terms of the periodic variation due to pulse-plating of the local Ni2+ concentration at the cathode-electrolyte interface.",
keywords = "Electrical transport, Nanocrystalline nickel, Pulse-plated nickel",
author = "E. T{\'o}th-K{\'a}d{\'a}r and I. Bakonyi and L. Pog{\'a}ny and A. Czir{\'a}ki",
year = "1997",
month = "1",
language = "English",
volume = "88",
pages = "57--65",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "1-3",

}

TY - JOUR

T1 - Microstructure and electrical transport properties of pulse-plated nanocrystalline nickel electrodeposits

AU - Tóth-Kádár, E.

AU - Bakonyi, I.

AU - Pogány, L.

AU - Cziráki, A.

PY - 1997/1

Y1 - 1997/1

N2 - The microstructure and the electrical transport properties (the electrical resistivity, its temperature coefficient and the thermoelectric power) were investigated for pulse-plated nanocrystalline nickel electrodeposits. Transmission and scanning electron microscopy were used to study the microstructure (grain size and lattice defects) and the surface morphology respectively. The samples were prepared from the same bath as used previously for d.c. plating and the deposition current density was constant, in most cases idep = 20 A dm-2. In a given series, the pulse length ton was kept constant at 0.001, 0.01, 0.1, 1 or 10 s and the separation between pulses toff was varied from 0.001 s to 10 s. Systematic variations of the electrical transport parameters with ton and toff were observed, which we attempt to explain in terms of the periodic variation due to pulse-plating of the local Ni2+ concentration at the cathode-electrolyte interface.

AB - The microstructure and the electrical transport properties (the electrical resistivity, its temperature coefficient and the thermoelectric power) were investigated for pulse-plated nanocrystalline nickel electrodeposits. Transmission and scanning electron microscopy were used to study the microstructure (grain size and lattice defects) and the surface morphology respectively. The samples were prepared from the same bath as used previously for d.c. plating and the deposition current density was constant, in most cases idep = 20 A dm-2. In a given series, the pulse length ton was kept constant at 0.001, 0.01, 0.1, 1 or 10 s and the separation between pulses toff was varied from 0.001 s to 10 s. Systematic variations of the electrical transport parameters with ton and toff were observed, which we attempt to explain in terms of the periodic variation due to pulse-plating of the local Ni2+ concentration at the cathode-electrolyte interface.

KW - Electrical transport

KW - Nanocrystalline nickel

KW - Pulse-plated nickel

UR - http://www.scopus.com/inward/record.url?scp=0030871575&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030871575&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0030871575

VL - 88

SP - 57

EP - 65

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 1-3

ER -