Method for independent control of particle size and distance in rhodium epitaxy on TiO2(110)-(1 × 2) surface An STM study

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Abstract

A method for independent control of the particle size and distance is presented for rhodium epitaxy on TiO2(110)-(1 × 2) surface. The real space imaging of the surface morphology was performed by scanning tunneling microscopy. The amount of the deposited rhodium was checked by Auger electron spectrometry. The method consists of two steps: (i) evaporation of 0.001-0.050 ML equivalent of rhodium at room temperature with a post-annealing at 1100 K ("seeding"); (ii) post-deposition of rhodium for growing of the Rh nanoparticles formed in step (i) ("growing"). The mechanism of this procedure is based on the large difference of the surface diffusion coefficient between Rh adatoms and Rh nanocrystallites larger than 1-2 nm. In the first step the average distance between the metal particles is controlled in the range 5-200 nm, the second step determines the particles size (2-50 nm). This work demonstrates that the diffusion processes of metal nanoparticles of different sizes and the growing modes of the crystallites can be studied in detail by application of seeded surfaces.

Original languageEnglish
Pages (from-to)281-289
Number of pages9
JournalSurface Science
Volume400
Issue number1-3
DOIs
Publication statusPublished - Mar 12 1998

Keywords

  • Diffusion and migration
  • Epitaxy
  • Growth
  • Metal-insulator interfaces
  • Nucleation
  • Rhodium
  • Scanning tunneling microscopy
  • Titanium oxide

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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